2015
DOI: 10.1016/j.mee.2015.03.021
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Multilayered structuring of thin-film PV modules by ultrafast laser ablation

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Cited by 20 publications
(1 citation statement)
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“…Ultrafast pulse lasers, with a frequency pulse ranging from 10 -12 to 10 -15 s, are the most widely used systems for patterning graphene for electronic devices. This is because, compared to the removal of materials by conventional and lower-cost long-pulse laser treatment, these lasers minimize the diffusion of energy through the material, and therefore create smaller heat-affected zones [12] [13]. Although femtosecond lasers have been widely used to enhance the resolution of the scribe lines [14] [19], several studies have recently reported the patterning of graphene by means of nanosecond pulse lasers which offer a wider choice of wavelengths than femtosecond lasers.…”
Section: Introductionmentioning
confidence: 99%
“…Ultrafast pulse lasers, with a frequency pulse ranging from 10 -12 to 10 -15 s, are the most widely used systems for patterning graphene for electronic devices. This is because, compared to the removal of materials by conventional and lower-cost long-pulse laser treatment, these lasers minimize the diffusion of energy through the material, and therefore create smaller heat-affected zones [12] [13]. Although femtosecond lasers have been widely used to enhance the resolution of the scribe lines [14] [19], several studies have recently reported the patterning of graphene by means of nanosecond pulse lasers which offer a wider choice of wavelengths than femtosecond lasers.…”
Section: Introductionmentioning
confidence: 99%