Low-energy-electron-diffraction intensity measurements and multiple scattering analysis are used to determine the multilayer surface relaxation of clean and hydrogen-dosed Nb͑100͒ as a function of temperature. Accurate characterization of residual surface impurity concentration ͑oxygen͒ based on Auger electron spectroscopy is used to obtain a meaningful extrapolation of the first-layer relaxation to the clean surface value: d 12 = 1.481± .05 Å corresponding to ⌬ 12 = −10± 3%, a 10% relaxation relative to the bulk value d 0 = 1.645 Å. This experimental result for d 12 can be used to judge the accuracy of recent ab initio calculations for Nb͑100͒. Temperature-dependent changes in surface relaxation resulting from hydrogen dosing of Nb͑100͒ manifest an expansion of the near-surface lattice resulting from subsurface hydrogen atoms. The hydrogen-induced expansion of near-surface interplanar separation is determined to be 3 ± 1% at T =125 K, 4±1% at T = 300 K, and −1±1% at T = 400 K. The measured hydrogen-induced surface lattice expansion is consistent with the bulk lattice constant change ͑⌬ ϳ 4.5% ͒ that occurs when Nb is hydrated to form NbH. The observed relaxation of the hydrogen-dosed near-surface interplanar separation to the clean surface value for T Ͼ 400 K is consistent with the subsurface "hydrogen valve" model that has been used to account for unusual hydrogen uptake kinetics associated with Nb͑100͒.