2022
DOI: 10.1016/j.solmat.2022.111643
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Multijunction solar cell mesa isolation: Correlation between process, morphology and cell performance

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Cited by 4 publications
(5 citation statements)
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“…This lower value can be explained by a higher saturation current, as observed in Figure 3b. The lower V oc relative to the standard cell can be attributed to higher surface recombination on the edges of each subcell introduced by the mesas etching steps and a higher surface/perimeter ratio [21]. The similar I-V characteristics confirm that the final MTMJSC device possesses comparable electronic properties to a reference cell when measured between the emitter of the top subcell and the base of the bottom subcell (see "complete cell" scheme in Figure 3a).…”
Section: I-v Measurementsmentioning
confidence: 76%
“…This lower value can be explained by a higher saturation current, as observed in Figure 3b. The lower V oc relative to the standard cell can be attributed to higher surface recombination on the edges of each subcell introduced by the mesas etching steps and a higher surface/perimeter ratio [21]. The similar I-V characteristics confirm that the final MTMJSC device possesses comparable electronic properties to a reference cell when measured between the emitter of the top subcell and the base of the bottom subcell (see "complete cell" scheme in Figure 3a).…”
Section: I-v Measurementsmentioning
confidence: 76%
“…Front‐contacted solar cells (represented in Figure a) were fabricated via three levels using our own designed photolithographic mask. The main steps include the creation of a mesa structure down to the GaAs buffer [ 17 ] using low‐damage plasma etching (a similar design reported in ref. [18]) and electrode metal depositions.…”
Section: Methodsmentioning
confidence: 99%
“…Compared to other isolation methods such as wet chemical etching or partial saw dicing, this process improves the Voc by 1 % for ~30 mm 2 solar cells. [15] When the P/A ratio increases, the optimized etch process keeps its superiority as illustrated figure 3a, with a Voc improvement of 10 mV compared to sub-optimal plasma etching process for a P/A of 40 cm -1 (1x1 mm 2 solar cell). Extrapolating the trend, we can anticipate a Voc of 2.365 V for 0.01 mm 2 solar cell (P/A of 400 cm -1 ) under one sun illumination.…”
Section: Mitigating Perimeter Effects In Sub-millimeter-scale Multiju...mentioning
confidence: 95%
“…More importantly, the width of the dicing line (kerf) is larger than 75 µm and damages the sidewall of devices. [15] This leads to a large waste of highvalue material when more dicing lines are required per wafer, i.e. when the dimension of the solar cells is reduced.…”
Section: Challenges Associated With Sub-millimeter-scale Multijunctio...mentioning
confidence: 99%