2008
DOI: 10.1016/j.polymer.2008.02.027
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Multicomponent vapor deposition polymerization of poly(methyl methacrylate) in an axisymmetric vacuum reactor

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Cited by 18 publications
(21 citation statements)
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“…Micrometer‐thick, high‐performance poly(benzoxazole) (PBO) coatings have also been vapor deposited 251. Uniform, 3 µm thick poly(methyl methacrylate) (PMMA) films have been synthesized using iCVD; less than 2% deviation in thickness was noted across the samples 252…”
Section: Characteristics Of Cvd Polymersmentioning
confidence: 99%
See 1 more Smart Citation
“…Micrometer‐thick, high‐performance poly(benzoxazole) (PBO) coatings have also been vapor deposited 251. Uniform, 3 µm thick poly(methyl methacrylate) (PMMA) films have been synthesized using iCVD; less than 2% deviation in thickness was noted across the samples 252…”
Section: Characteristics Of Cvd Polymersmentioning
confidence: 99%
“…Comparison of the interferometry results with data collected using an independent method yields a calibration that can be used to continuously monitor film growth. Utilization of optically transparent casings for iCVD reactors enables real‐time determination of film thickness, allowing the user to terminate the deposition once the desired result has been achieved 5, 188, 252, 253. Single and multiple wavelength interferometry have also been used for in situ probing of the thermal properties of polymeric thin films 254, 255…”
Section: Characteristics Of Cvd Polymersmentioning
confidence: 99%
“…Chemical vapor deposition. Developed fairly recently [6,7,8]. Monomer and initiator vapors are introduced to an oxygen-free reaction chamber with the substrate.…”
Section: Coating Methodsmentioning
confidence: 99%
“…Another special type of CVD process for the deposition of polymer thin fi lms is the so called initiated CVD (iCVD) for example for PMMA (Chan and Gleason, 2005;Chen and Anthamatten, 2008) 10.15 Deposition set-up for poly-para-xylylene (Neubert et al ., 2011b). methacrylate) (PGMA) (Spee et al ., 2011) thin fi lms.…”
Section: Non-plasma Activated Chemical Vapor Depositionmentioning
confidence: 99%