Multicomponent Hf-Nb-Ti-V-Zr nitride coatings by reactive magnetron sputter deposition

Johansson, K.; Riekehr, Lars; Fritze, Stefan; Lewin, Erik

doi:10.1016/j.surfcoat.2018.06.030

Cited by 64 publications

(38 citation statements)

References 46 publications

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“…An Ar + plasma was ignited at 0.4 Pa, using a 42 sccm Ar gas flow. A detailed description of the experimental chamber can be found in reference [ 29 , 30 ]. Prior to the depositions, the single-crystal Si(001) and α-Al 2 O 3 (00l) substrates were pre-heated to the desired temperature for at least 60 min to minimise the temperature gradient, and the substrates were biased to −50 V. Three different temperatures were used: room temperature (RT), 275 °C, and 450 °C, where RT implies that no external heating was applied, i.e., the substrate was only heated by the arriving high-energetic sputtered particles.…”

Section: Methodsmentioning

confidence: 99%

Influence of Deposition Temperature on the Phase Evolution of HfNbTiVZr High-Entropy Thin Films

et al. 2019

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In this study, we show that the phase formation of HfNbTiVZr high-entropy thin films is strongly influenced by the substrate temperature. Films deposited at room temperature exhibit an amorphous microstructure and are 6.5 GPa hard. With increasing substrate temperature (room temperature to 275 °C), a transition from an amorphous to a single-phased body-centred cubic (bcc) solid solution occurs, resulting in a hardness increase to 7.9 GPa. A higher deposition temperature (450 °C) leads to the formation of C14 or C15 Laves phase precipitates in the bcc matrix and a further enhancement of mechanical properties with a peak hardness value of 9.2 GPa. These results also show that thin films follow different phase formation pathways compared to HfNbTiVZr bulk alloys.

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Section: Methodsmentioning

confidence: 99%

Influence of Deposition Temperature on the Phase Evolution of HfNbTiVZr High-Entropy Thin Films

et al. 2019

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“…One common class of methods is physical vapour deposition, such as thermal or electron beam evaporation, cathodic arc deposition, ion-plating, ion beam sputtering, pulsed laser deposition and various types of sputtering processes. Among these, the physical vapor deposition techniques including magnetron sputtering [66][67][68][69] , and cathodic arc deposition [39,70] are utilized for the fabrication of multicomponent nitride films. Chemical vapor deposition (CVD) is another versatile technique to deposit high-quality films by gas chemical reaction with each other.…”

Section: Thin Film Deposition and Growthmentioning

confidence: 99%

Nonstoichiometric Multicomponent Nitride Thin Films

Shu

2020

Linköping Studies in Science and Technology. Licentiate Thesis

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High entropy ceramics have rapidly developed as a class of materials based on high entropy alloys; the latter being materials that contain five or more elements in near-equal proportions. Their unconventional compositions and chemical structures hold promise for achieving unprecedented combinations of mechanical, electrical and chemical properties. In this thesis, high entropy ceramic films, (TiNbZrTa)Nx were deposited using reactive magnetron sputtering with segmented targets. The stoichiometry x was tuned with two deposition parameters, i.e., substrate temperature and nitrogen flow ratio fN, their effect on microstructure and mechanical, electric, and electrochemical properties were investigated.

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“…In the original high entropy alloy (HEA) concept, five metallic elements are mixed in approximately equimolar concentrations. Recently, the concept has been expanded to high entropy borides, carbides, nitrides, and oxides (Rost et al, 2015; Gild et al, 2016; Castle et al, 2018; Johansson et al, 2018). The formation of intermetallic phases is intuitively expected but single-phase solid solutions with cubic closed packed or body centered cubic (bcc) structures are often formed (Miracle & Senkov, 2017).…”

Section: Introductionmentioning

confidence: 99%

Elemental Distribution in CrNbTaTiW-C High Entropy Alloy Thin Films

et al. 2019

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The microstructure and distribution of the elements have been studied in thin films of a near-equimolar CrNbTaTiW high entropy alloy (HEA) and films with 8 at.% carbon added to the alloy. The films were deposited by magnetron sputtering at 300°C. X-ray diffraction shows that the near-equimolar metallic film crystallizes in a single-phase body centered cubic (bcc) structure with a strong (110) texture. However, more detailed analyses with transmission electron microscopy (TEM) and atom probe tomography (APT) show a strong segregation of Ti to the grain boundaries forming a very thin Ti–Cr rich interfacial layer. The effect can be explained by the large negative formation enthalpy of Ti–Cr compounds and shows that CrNbTaTiW is not a true HEA at lower temperatures. The addition of 8 at.% carbon leads to the formation of an amorphous structure, which can be explained by the limited solubility of carbon in bcc alloys. TEM energy-dispersive X-ray spectroscopy indicated that all metallic elements are randomly distributed in the film. The APT investigation, however, revealed that carbide-like clusters are present in the amorphous film.

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Multicomponent Hf-Nb-Ti-V-Zr nitride coatings by reactive magnetron sputter deposition

Cited by 64 publications

References 46 publications

Influence of Deposition Temperature on the Phase Evolution of HfNbTiVZr High-Entropy Thin Films

Influence of Deposition Temperature on the Phase Evolution of HfNbTiVZr High-Entropy Thin Films

Nonstoichiometric Multicomponent Nitride Thin Films

Elemental Distribution in CrNbTaTiW-C High Entropy Alloy Thin Films

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