2021
DOI: 10.1109/led.2021.3060589
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Multibit Ferroelectric FET Based on Nonidentical Double HfZrO2 for High-Density Nonvolatile Memory

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Cited by 47 publications
(14 citation statements)
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“…This is a dramatic improvement over the endurance of FeFETs based on thick ferroelectric films or large memory windows reported so far. 11,16,32 The inset in Fig. 3(e) shows the endurance according to the capacitance ratio.…”
Section: Resultsmentioning
confidence: 99%
“…This is a dramatic improvement over the endurance of FeFETs based on thick ferroelectric films or large memory windows reported so far. 11,16,32 The inset in Fig. 3(e) shows the endurance according to the capacitance ratio.…”
Section: Resultsmentioning
confidence: 99%
“…Ferroelectric FETs (FEFETs), in which the ferroelectric material is integrated within the gate stack of a transistor (Yu et al, 2021), offer appealing attributes that mitigate the concerns of FERAMs. For instance, FEFETs feature separation of read-write paths, non-destructive read, and high distinguishability while retaining the benefits of electric field-driven write (Yu et al, 2021) and offering other advantages such as multilevel storage (Ni et al, 2018;Dutta et al, 2020;Kazemi et al, 2020;Liao et al, 2021). However, they are known to suffer from variability, endurance, and retention concerns due to traps at the ferroelectric-dielectric interface and depolarization fields in the ferroelectric.…”
Section: Background Of Ferroelectric-based Memoriesmentioning
confidence: 99%
“…1,2 Because of these advantages, hafnium oxide-based ferroelectric materials have been widely used in memory applications. 3–5…”
Section: Introductionmentioning
confidence: 99%
“…1,2 Because of these advantages, hafnium oxide-based ferroelectric materials have been widely used in memory applications. [3][4][5] However, the wake-up and fatigue effects exhibited by ferroelectric HfO 2 during electrical cycling limit the application of HfO 2 in ferroelectric memory devices. 6,7 To effectively address this problem, a clear understanding of the underlying mechanisms is indispensable.…”
Section: Introductionmentioning
confidence: 99%