2021 IEEE/CVF International Conference on Computer Vision Workshops (ICCVW) 2021
DOI: 10.1109/iccvw54120.2021.00075
|View full text |Cite
|
Sign up to set email alerts
|

Multi-Prototype Few-shot Learning in Histopathology

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

2022
2022
2023
2023

Publication Types

Select...
3
2
1

Relationship

0
6

Authors

Journals

citations
Cited by 11 publications
(2 citation statements)
references
References 10 publications
0
2
0
Order By: Relevance
“…Originated in few-shot learning, multi-prototype learning aims to address the challenging of fitting prototypical network [25] for multi-modal data distribution [5], [26], [27] by learning prototypes for recognizing classes with few training examples. The first attempt, IMP [5], proposed to adaptively expand prototype pool following a Chinese restaurant process which sequentially processes data points.…”
Section: Multi-prototype Learningmentioning
confidence: 99%
See 1 more Smart Citation
“…Originated in few-shot learning, multi-prototype learning aims to address the challenging of fitting prototypical network [25] for multi-modal data distribution [5], [26], [27] by learning prototypes for recognizing classes with few training examples. The first attempt, IMP [5], proposed to adaptively expand prototype pool following a Chinese restaurant process which sequentially processes data points.…”
Section: Multi-prototype Learningmentioning
confidence: 99%
“…The first attempt, IMP [5], proposed to adaptively expand prototype pool following a Chinese restaurant process which sequentially processes data points. [27] proposes a kmeans extension of Prototypical Networks. Despite the success in few-shot learning, it is impractical to trivially apply the sequential IMP to weakly supervised learning due to computation cost while other offline methods prevents endto-end training of prototypes.…”
Section: Multi-prototype Learningmentioning
confidence: 99%