2015
DOI: 10.1016/j.mssp.2015.06.050
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Multi-objective optimization for silicon wafer slicing using wire-EDM process

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Cited by 37 publications
(18 citation statements)
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References 14 publications
(19 reference statements)
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“…A thin layer of thermal damage was observed on the wafer surface, and it was largely influenced by the exposure duration of plasma. The influence of controlled input parameters on the resultant thickness of the wafers and kerf-loss were analysed exclusively [13]. Researchers have also tried to propose a hybrid technique for wafer slicing which combines wire saw method and WEDM together.…”
Section: Introductionmentioning
confidence: 99%
“…A thin layer of thermal damage was observed on the wafer surface, and it was largely influenced by the exposure duration of plasma. The influence of controlled input parameters on the resultant thickness of the wafers and kerf-loss were analysed exclusively [13]. Researchers have also tried to propose a hybrid technique for wafer slicing which combines wire saw method and WEDM together.…”
Section: Introductionmentioning
confidence: 99%
“…However, the review presented in this paper is on current research trends carried out by various researchers studying the parametric influence on machining characteristics of WEDM process, machining advanced materials by using WEDM and modelling techniques in predicting the performance of WEDM process. WEDM process were developed in many areas, such as machining of advanced materials [15][16][17][18][19][20][21][22][23][24][25] and combining technology of grinding, milling, and turning with WEDM that benefits the virtue of both processes [3][4][5][6][8][9][10]. The topics are selected due to a growing need for machining advanced materials, novel techniques developed by using WEDM, and understanding the performance of WEDM (machining characteristics and modelling techniques).…”
Section: Spark Gapmentioning
confidence: 99%
“…However, increasing the wire tension led to machining instability. Dongree et al [17] proposed a hypothesis of by using WEDM process as an alternative for conventional methods for silicon wafer slicing. Gee et al [18] studied the variation in thickness of deterioration layer of monocrystalline silicon under different machining conditions.…”
Section: Wedm Of Advanced Materialsmentioning
confidence: 99%
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“…Experiments have been performed with four machining variables, pulse on time, pulse off time, spark voltage, peak current. Ganesh Dongre et al investigates the optimization of silicon wafer slicing by wire EDM process [31]. They deduced that work piece height, wire diameter, duty cycle and current are the control parameters of wafer slicing.…”
Section: Influence Of Electrical Process Parametersmentioning
confidence: 99%