2021
DOI: 10.1063/5.0049536
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Multi-mode resistive spectroscopy for precisely controlling morphology of extremely narrow gap palladium nanocluster array

Abstract: During the deposition of a metallic material on a substrate, a nanocluster-array structure with an extremely narrow gap is formed transiently at the transition between isolated clusters and the continuous film. It is known that the nanocluster array shows a unique electrical property different from that of isolated clusters and the continuous film. The electrical property of the nanocluster array changes significantly depending on its morphology, and precise control of the deposition time is indispensable to o… Show more

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Cited by 3 publications
(1 citation statement)
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“…To solve this problem, we use resistive spectroscopy. This method, originally developed to monitor morphological changes in nanoparticles during deposition, has been used to synthesize nanoparticles with extremely narrow gaps on a substrate [20][21][22]. This method measures the electrical resistance between nanoparticles using the resonant vibration of a piezoelectric resonator, and the gap distance is evaluated based on the resonance results.…”
Section: Introductionmentioning
confidence: 99%
“…To solve this problem, we use resistive spectroscopy. This method, originally developed to monitor morphological changes in nanoparticles during deposition, has been used to synthesize nanoparticles with extremely narrow gaps on a substrate [20][21][22]. This method measures the electrical resistance between nanoparticles using the resonant vibration of a piezoelectric resonator, and the gap distance is evaluated based on the resonance results.…”
Section: Introductionmentioning
confidence: 99%