Multi-beam Inspection (MBI) development progress and applications

Long, Eric; Ren, Weiming; Luo, Xinan; Zhao, Shengdun; Hu, Xuerang; Liu, Xuedong; Kuan, Chiyan; Chou, Kevin; Maassen, Martijn; Yin, Weihua; Chen, Aiden; Sen, N.; Ebert, Martin; Liu, Lei; Wang, Fei; Patterson, Oliver D.

doi:10.1117/12.2553556

Cited by 6 publications

(5 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The wide variety of investigations reported in this work were possible thanks to the dedication of many contributors from different companies. In particular, wish to thank: Some of the material in this paper has been published in the proceedings of SPIE Advanced Lithography [5][6][7][8][9][10][11][12]. .…”

Section: Acknowledgementmentioning

confidence: 99%

“…In Chapter 2 we will discuss the following application use cases, related to the clustering discussed in Fig. Each of these items have been recently reported in detail [5][6][7][8][9][10][11][12] and are the results of join imec collaborations with various equipment vendors on critical issues in advanced ICM. Each one of these investigations uses advanced settings either in terms of Data Acquisition or Data Processing, or both.…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Trends in e-beam metrology and inspection

Lorusso

2024

Metrology, Inspection, and Process Control XXXVIII

View full text Add to dashboard Cite

For many years, e-beam SEM metrology has been quite conservative. However, a few years ago, we began to observe a sort of restlessness in the field, a trend that was consistently confirmed year after year since then. Such a change was mainly driven by the daunting specification requirements for the advanced metrology nodes and High Numerical Aperture Extreme Ultraviolet Lithography (High NA EUVL), as well as by the device evolution in terms of architecture. We observed a systematic attempt to expand the application space in which the e-beam SEM had operated, tackling issues ranging from metrology of 3D structures to edge placement error, voltage contrast, e-beam inspection, and more.Such an expansion of the application space has forced heavily automated SEM to evolve into something different: a more flexible and powerful e-beam tool focusing not only on CD metrology, but on a range of novel use cases. To implement these new applications, it soon became evident that it was necessary to expand the range and type of tool specifications and features. We observed changes in landing energy, beam current, resolution, as well as algorithms. The detection process changed too, and higher current and better detection efficiency opened the door to a variety of back-scattered electron applications. Artificial intelligence is now critical not only in terms of speed of analysis, but most importantly for the quality of its results. Multibeam tools are fast approaching and have the potential to become a central technology element in the high-NA EUVL environment, where resolution and throughput for inspection must go hand-in-hand. In this paper, we provide an overview of the recent trends in e-beam metrology and inspection. e-beam, CD SEM, e-beam Inspection, Multibeam, e-beam Review Invited Paper

show abstract

Section: Acknowledgementmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Trends in e-beam metrology and inspection

Lorusso

2024

Metrology, Inspection, and Process Control XXXVIII

View full text Add to dashboard Cite

show abstract

“…Furthermore, a higher coherence [4,5], a higher brightness [4,6] and narrower energy distribution can be realized [4,5,7]. The high possible switching rate up to the THz/GHz range enables high frequency applications like traveling wave tubes [2], THz sources [8], pulsed X-Ray communication [9] as well as sequential multibeam devices for lithography [10], wafer inspection [11] or multibeam computertomography [12]. To reach even smaller time scales down to the attosecond range a short laser pulse controlled emission process can be used [13].…”

Section: Introductionmentioning

confidence: 99%

The “LED‐version” of the electron gun

Bachmann¹,

Düsberg²,

Pahlke³

et al. 2023

Vak Forsch Prax

View full text Add to dashboard Cite

Summary We report on our progress to develop and optimize electron sources for practical applications. A simple fabrication process is introduced based on a wafer dicing saw and a wet chemical etch step without the need for a clean room. Due to the formation of crystal facets the samples show a homogeneous geometry throughout the array. Characterization techniques are developed to systematically compare various arrays. A very defined measurement procedure based on current controlled IV‐sweeps as well as lifetime measurements at various currents is proposed. To investigate the current distribution in the array a commercial CMOS detector is used and shows the potential for in depth analysis of the arrays. Finally, a compact hermetically sealed housing is presented enabling electron generation in atmospheric pressure environments.

show abstract

“…Ultrafast and ultrashort pulsed electron beams have been widely used in characterization of materials and devices, and many breakthroughs have been highly recognized. Recent trends have seen signi cant achievements in ultrahigh spatio-temporal resolution electron analytical studies [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15] , including ultrafast imaging of low-energy electron diffraction 1,[3][4][5] , ultrafast transmission and scanning electron microscopies 2,[6][7][8][9][10][11][12][13] , and high-throughput analysis with a nanoscale resolution for 300 mm silicon wafer 14,15 . These breakthroughs cannot be achieved without the signi cant advances in electron beam science and technology.…”

Section: Introductionmentioning

confidence: 99%

Synchronously generating ultrashort pulses of electromagnetic radiation and electron beam for ultrahigh spatio-temporal resolution characterization

Deng,

Shen,

et al. 2023

Preprint

View full text Add to dashboard Cite

Ultrashort pulsed electron beam with high brightness and low energy spread enables ultrahigh resolution of spatio-temporal characterization of materials and devices. So far, this is done using ultrashort electron pulse as probe and ultrashort laser pulse as pump. Adding powerful analytical capability with multimode-excitation is urged to meet rapidly rising need. We envision that it will provide plentiful new insides if characterizations are carried out with excitation simultaneously using ultrashort electron pulses and ultrashort electromagnetic wave pulses. In particular, for brain science and Internet of Things (IoT), electromagnetic wave is an unavoidable existing factor, such as in brain neuroscience and brain computer interface. Here, it is revealed that an ultrashort pulsed electron beam itself radiates electromagnetic waves. We demonstrate that both ultrashort pulsed electron beam and GHz’s electromagnetic waves may be synchronously generated by a photo-excited electron emission using picosecond laser of a few milli watts and 80 MHz. We also establish a systematic study for obtaining crucial characteristics of the pulsed electron beam, including energy spread as low as 0.97 eV, current density over 0.9 A·cm− 2, spot diameter < 145 µm, divergence < 14.22°, high reduced brightness up to 8.81×109 A·m− 2·sr− 1·V− 1. The synchronous electromagnetic wave pulses carry high frequencies of 2.3, 5.7, and 9.2 GHz, with peak power density over 90 mW·cm− 2 at pulsed charge below 0.7 pC. The results satisfy ultrahigh spatio-temporal resolution characterization of multimode-excitation, and provide a pioneering direction that previously impossible, to reveal new insides of materials and devices concerned with brain science and IoT.

show abstract

Multi-beam Inspection (MBI) development progress and applications

Cited by 6 publications

References 0 publications

Trends in e-beam metrology and inspection

Trends in e-beam metrology and inspection

The “LED‐version” of the electron gun

Synchronously generating ultrashort pulses of electromagnetic radiation and electron beam for ultrahigh spatio-temporal resolution characterization

Contact Info

Product

Resources

About