2013
DOI: 10.1016/j.jcrysgro.2012.09.055
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MOVPE growth, optical and electrical characterization of thick Mg-doped InGaN layers

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Cited by 4 publications
(2 citation statements)
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“…The construction of M-S heterojunction and the introduction of La lead to a strong compensation of free holes and p-type conductivity. [43] In addition, the absolute value of La/La 2 O 2 S 1Àx slope is higher than that of La/La 2 O 2 S, indicating higher acceptor concentration and decrease of hole concentration in the valence band in La/La 2 O 2 S 1Àx [44,45] which is attributed to higher energy of valance band (E v ) in La/La 2 O 2 S 1Àx compared with La/La 2 O 2 S. The fall of the energy barrier in La/La 2 O 2 S 1Àx decreases the hole concentration and reduces the probability of recombination of holes and electrons, thus boosting the electrocatalytic performances.…”
Section: Electrocatalytic Performancesmentioning
confidence: 99%
“…The construction of M-S heterojunction and the introduction of La lead to a strong compensation of free holes and p-type conductivity. [43] In addition, the absolute value of La/La 2 O 2 S 1Àx slope is higher than that of La/La 2 O 2 S, indicating higher acceptor concentration and decrease of hole concentration in the valence band in La/La 2 O 2 S 1Àx [44,45] which is attributed to higher energy of valance band (E v ) in La/La 2 O 2 S 1Àx compared with La/La 2 O 2 S. The fall of the energy barrier in La/La 2 O 2 S 1Àx decreases the hole concentration and reduces the probability of recombination of holes and electrons, thus boosting the electrocatalytic performances.…”
Section: Electrocatalytic Performancesmentioning
confidence: 99%
“…A similar annealing is necessary to get a low resistive pInGaN. In almost all cases, temperatures of Mg activation (T act ) for InGaN are lower than those for their growth (T g ) [4][5][6][7][8][9]. However, it has been still unclear that the preparation of p-InGaN with intermediate In compositions needs T act same as that for p-GaN preparation.…”
mentioning
confidence: 99%