Nanoengineering: Fabrication, Properties, Optics, and Devices XIV 2017
DOI: 10.1117/12.2273846
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MoS2 thin films prepared by sulfurization

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Cited by 6 publications
(5 citation statements)
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“…The Mo layer was annealed in sulfur vapors at a high temperature of 800 °C in a N 2 atmosphere at ambient pressure. The substrate was placed together with the sulfur powder in the center of the furnace so that the temperature of the substrate and the powder were the same during the growth, , unlike the standard CVD method, which uses a two-zone furnace with different temperatures for the sulfur powder and the Mo substrate.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The Mo layer was annealed in sulfur vapors at a high temperature of 800 °C in a N 2 atmosphere at ambient pressure. The substrate was placed together with the sulfur powder in the center of the furnace so that the temperature of the substrate and the powder were the same during the growth, , unlike the standard CVD method, which uses a two-zone furnace with different temperatures for the sulfur powder and the Mo substrate.…”
Section: Methodsmentioning
confidence: 99%
“…A higher contact angle means more terminated hydrogen on the surface and thus a better response to the exposed gas. It should be noted that the optimal contact angle for a good H-termination is at least 90°. ,, The contact angle of the prepared H-NCD/SiO 2 /Si samples was evaluated to be greater than 100°. The photographs of the measured contact angles are given in the Supporting Information (Table S1).…”
Section: Methodsmentioning
confidence: 99%
“…The XRD spectra of the MoS x films are shown in Figure 4a The presence of such a number of peaks indicates that the films reveal a polycrystalline structure [46]. Moreover, for MoS x coatings with x > 1.3, the formation of a hexagonal atomic arrangement has the highest probability [18].…”
Section: Structural Properties Of the Mos X Filmsmentioning
confidence: 99%
“…The diffraction peaks at about 44° and 64° stem from the 100Cr6 substrate, while the other Bragg peaks are attributed to diffractions from the (002), (100), (101) and (110) planes of MoSx. The presence of such a number of peaks indicates that the films reveal a polycrystalline structure [46]. Moreover, for MoSx coatings with x > 1.3, the formation of a hexagonal atomic arrangement has the highest probability [18].…”
Section: Structural Properties Of the Mos X Filmsmentioning
confidence: 99%
“…Some of the Mo layers were left as-prepared, while some of the pre-deposited Mo layers were sulfurized in a custom-designed CVD chamber with a substrate and sulfur powder (0.5 g) placed at the same position and temperature in the center of the furnace − so-called one-zone sulfurization. 27 The annealing temperature, time, and heating ramp were 800 °C, 30 min, and 25 °C/min, respectively. The thickness of the MoS 2 films after sulfurization was found to be four times larger than that of the of initial Mo layer.…”
Section: ■ Introductionmentioning
confidence: 99%