2020
DOI: 10.1021/acs.jpcc.0c03082
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Morphology of Thin Films of Aromatic Ellagic Acid and Its Hydrogen Bonding Interactions

Abstract: Ellagic acid (EA), an antioxidant from fruits or other plants, has recently evoked interest in the field of organic electronics because of its weak electron donor properties. In this work, the preparation of uniaxial π-stacked EA films by thermal evaporation on different surfaces is reported for the first time. The (102) lattice plane of the π-electron system was confirmed as the contact plane for one monolayer equivalent on Ag(111) by lowelectron energy diffraction. X-ray and atomic force microscopy measureme… Show more

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Cited by 4 publications
(14 citation statements)
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“…Specular X-ray diffraction (XRD) measurements to explicitly probe q z were not feasible for these 5 nm thin films as it would require extremely long signal integration times. However, for thicker EA films (30 nm), these reference measurements were performed and the π-stacking texture was ascertained . Consequently, the same texture can be assumed for the 5 nm thin films based on the presented GIWAXS data.…”
Section: Results and Discussionmentioning
confidence: 99%
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“…Specular X-ray diffraction (XRD) measurements to explicitly probe q z were not feasible for these 5 nm thin films as it would require extremely long signal integration times. However, for thicker EA films (30 nm), these reference measurements were performed and the π-stacking texture was ascertained . Consequently, the same texture can be assumed for the 5 nm thin films based on the presented GIWAXS data.…”
Section: Results and Discussionmentioning
confidence: 99%
“…Ellagic acid (2,3,7,8-tetrahydroxychromeno­[5,4,3- cde ]­chromene-5,10-dione, Alfa Aesar, A15722) was used in solar cells as received. For other studies, it was purified once by vacuum-gradient sublimation by the Surface Science Group of Friedrich-Schiller University, Jena, Germany . All layer stacks were deposited via thermal evaporation in a UHV chamber (CreaPhys GmbH, Germany) at a base pressure of 10 –7 –10 –8 mbar using a deposition rate of 0.1–0.3 Å/s.…”
Section: Experimental Sectionmentioning
confidence: 99%
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