Abstract:We investigate the characteristics of polycrystalline Silicon (poly-Si) thin films for solar cells produced by very high frequency (VHF) plasma enhanced chemical vapor deposition using a conductive scanning probe microscope (SPM). We measure the surface morphology and local current images are simultaneously of the poly-Si layers with a thickness, d=2 mm, formed on textured Ag/SnO2/glass in the range of RMS based-textured substrate (a) s=85nm, (b) s=42nm and (c) s=2nm respectively. Influences of the substrate t… Show more
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