Monte-Carlo simulation of the beam flux distribution of molecular-beam epitaxy sources by consideration of intermolecular collisions

Abstract

The Monte‐Carlo simulation of beam flux distribution of molecular‐beam epitaxy sources is extended to the region, where intermolecular collision cannot be neglected. When the mean free path becomes very small in comparison to the source dimensions, a effective source length will introduced to reduce the calculating time extremely. The similarity between the result of the simulation, the particle number profile, and the object of digital image processing is discussed. A method of digital image processing is used to reduce the calculating time and to improve the accuracy of the simulation with experiment. The average filter in real space is useful for successfully image filtering.