2005
DOI: 10.1051/epjap:2005047
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MONOX: a characterization tool for the X-UV range

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Cited by 10 publications
(10 citation statements)
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“…Regarding the reflectance, it decreases by a factor slightly less than 4 when going from the MM to the EM whatever the range, see Table . Two reasons for this large variation have been identified as follows: The Γ ratio of the grating is only 0.18 because of an over‐etching; this is not the optimum value, which is in the 0.25–0.35 range; a Γ ratio in this range would have limited the reflectivity decrease to only 30%; The first step of the patterning process is the deposition of a SiO 2 layer requiring that the sample stays at 300 °C during at least 15 min; this condition leads to a degradation of the MM structural quality, as we have checked from reflectivity measurements in the Cu L (930 eV, 1.33 nm) range with the MONOX spectro‐goniometer; preliminary silica depositions at 150 °C show that the MM reflectance is unaffected by this temperature annealing.…”
Section: Preparation and Characterization Of The Multilayer Gratingmentioning
confidence: 99%
“…Regarding the reflectance, it decreases by a factor slightly less than 4 when going from the MM to the EM whatever the range, see Table . Two reasons for this large variation have been identified as follows: The Γ ratio of the grating is only 0.18 because of an over‐etching; this is not the optimum value, which is in the 0.25–0.35 range; a Γ ratio in this range would have limited the reflectivity decrease to only 30%; The first step of the patterning process is the deposition of a SiO 2 layer requiring that the sample stays at 300 °C during at least 15 min; this condition leads to a degradation of the MM structural quality, as we have checked from reflectivity measurements in the Cu L (930 eV, 1.33 nm) range with the MONOX spectro‐goniometer; preliminary silica depositions at 150 °C show that the MM reflectance is unaffected by this temperature annealing.…”
Section: Preparation and Characterization Of The Multilayer Gratingmentioning
confidence: 99%
“…The EM is first inserted in the MONOX goniometer [22] used as a plane spectrometer operating in the WDS mode. A boron carbide (B 4 C) thin film deposited onto a silicon substrate is used as the target in the X-ray tube.…”
Section: Insertion In a Plane Spectro-goniometermentioning
confidence: 99%
“…We test the performances of the system DUVEX by means of the MONOX facility [1]. The radiation emitted by the soft-x-ray source was monochromatized with the help of crystals or multilayer Bragg mirrors setup in the monochromator unit of MONOX.…”
Section: Tests At Various Emission Lines In the Soft-x-ray Rangementioning
confidence: 99%
“…This work was initially motivated by the development of a counting system dedicated to soft-x-ray and E-UV (Extreme UV) radiation, in particular at the 30.4 nm wavelength (40.75 eV) corresponding to the He II emission line and compatible with radiation sources emitting parasitic visible light. Such sources are discharge lamps or modified Coolidge x-ray tube as the one setup in our laboratory reflectometer [1], both of them being a source of relatively intense visible light flux. Standard detectors for this spectral domain such as photodiodes or channeltrons were unsuccessfully tested for this purpose.…”
Section: / Introductionmentioning
confidence: 99%