Eurosensors 2018 2018
DOI: 10.3390/proceedings2131023
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Monolithically Integrated, CMOS-Compatible SiN Photonics for Sensing Applications

Abstract: As a leading provider of sensing solutions ams AG is developing semiconductor sensors in a wide variety of fields. One of the key competences of ams AG lies in optical sensing. To widen the company’s portfolio in this field we have been developing processes for fully integrated CMOS compatible photonic components based on Si3N4 in the last few years. This contribution will give an overview of the Si3N4 process as a post-processing flow for standard CMOS, some basic photonic building blocks and their properties… Show more

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Cited by 12 publications
(6 citation statements)
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“…A description of what such a CMOS-compatible photonic process flow could look like can be found in ref. 42 . The inset of Fig.…”
Section: Arrayed Waveguide Gratingmentioning
confidence: 99%
“…A description of what such a CMOS-compatible photonic process flow could look like can be found in ref. 42 . The inset of Fig.…”
Section: Arrayed Waveguide Gratingmentioning
confidence: 99%
“…The SiN waveguides were fabricated at ams AG in a CMOS-compatible process using lowtemperature plasma-enhanced chemical vapor deposition (PECVD), deep UV photolithography, and reactive ion etching, which allows monolithic co-integration in the back-end-of-line (BEOL) with silicon photodiodes and read-out electronics [18]. The upper and lower SiO 2 cladding thickness was set to 3 µm.…”
Section: Retinal Oct Imaging At 840 Nmmentioning
confidence: 99%
“…The different crossing configurations were then fabricated by ams AG on their SiN photonic platform [53]. The measurements of the fabricated crossings were performed with cleaved polarization maintaining fibers coupled to the device under test via end facet coupling.…”
Section: Measurement and Simulationsmentioning
confidence: 99%