“…While there are several studies that support this focal adhesion confinement model (den Braber et al, 1998; Saito et al, 2014), it is not clear how the confinement model, which is centered around lateral ( x , y ) topographical constraints, is consistent with the overall larger trend observed of a depth‐dependent ( z ) cellular response in the literature (Leclech & Barakat, 2021). To investigate the underlying mechanisms of the depth‐related contact guidance response, we have expanded upon a previously established fabrication method that is suited for deep etching to include a set of monolithic quartz chips with depths of 330, 725, and 1000 nm (Robitaille, Christodoulides, Liu, Kang, Byers, Doctor, et al, 2020). This fabrication method is ideal as it allows for tightly controlled surface roughness (sub nm) to avoid competing topographical cues (i.e., roughness changing within a given topographical condition, or with altered topographical conditions).…”