2023
DOI: 10.1007/s40820-023-01042-4
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Monolayer MoS2 Fabricated by In Situ Construction of Interlayer Electrostatic Repulsion Enables Ultrafast Ion Transport in Lithium-Ion Batteries

Abstract: Highlights In-situ construction of electrostatic repulsion between MoS 2 interlayers is first proposed to successfully prepare Co-doped monolayer MoS 2 under high vapor pressure. The doped Co atoms radically decrease bandgap and lithium ion diffusion energy barrier of monolayer MoS 2 and can be transformed into ultrasmall Co nanoparticles (~2 nm) to induce… Show more

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Cited by 24 publications
(16 citation statements)
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References 56 publications
(105 reference statements)
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“…In Figure a, it is obvious that as the amount of embedded Zn 2+ increases from 0 to 0.18 mmol, the diffraction peak associated with the MoS 2 (002) plane moves to a lower angle from 14.34° to 13.35°. The shift of the XRD peak further confirms the expansion of the interlayer spacing, which is consistent with the results obtained by HRTEM . The fwhm of the peak near 14° in the XRD spectrum of the sample was fitted.…”
Section: Results and Discussionsupporting
confidence: 89%
See 1 more Smart Citation
“…In Figure a, it is obvious that as the amount of embedded Zn 2+ increases from 0 to 0.18 mmol, the diffraction peak associated with the MoS 2 (002) plane moves to a lower angle from 14.34° to 13.35°. The shift of the XRD peak further confirms the expansion of the interlayer spacing, which is consistent with the results obtained by HRTEM . The fwhm of the peak near 14° in the XRD spectrum of the sample was fitted.…”
Section: Results and Discussionsupporting
confidence: 89%
“…The shift of the XRD peak further confirms the expansion of the interlayer spacing, which is consistent with the results obtained by HRTEM. 29 The fwhm of the peak near 14°in the XRD spectrum of the sample was fitted.…”
Section: Resultsmentioning
confidence: 99%
“…The desirable electronic conductivity, low K-ion migration barrier, and high diffusion coefficient of Co-EG/S V -MoS 2 enable its superior rate performance. As shown in Figure l, a radar chart summarizes and compares various parameters, including the interlayer distance, 1T phase content, migration barrier, cycling numbers, and specific capacitance, of the Co-EG/S V -MoS 2 electrode with other reported MoS 2 -based electrodes that have been optimized through strategies such as structural optimization, composite engineering, 1T phase transition, anion vacancy, and cation substitution . Compared with these alternative optimization strategies, the hierarchical confinement design demonstrates greater advantages and potential for enhancing the capacitive performance.…”
Section: Resultsmentioning
confidence: 99%
“…As shown in Figure 4l, a radar chart summarizes and compares various parameters, including the interlayer distance, 1T phase content, migration barrier, cycling numbers, and specific capacitance, of the Co-EG/S V -MoS 2 electrode with other reported MoS 2 -based electrodes that have been optimized through strategies such as structural optimization, 40 composite engineering, 41 1T phase transition, 42 anion vacancy, 43 and cation substitution. 44 Compared with these alternative optimization strategies, the hierarchical confinement design demonstrates greater advantages and potential for enhancing the capacitive performance. The enhanced electrochemical performance of Co-EG/S V -MoS 2 is attributed to the following factors: (i) Abundant sulfur vacancies are created in Co-EG/S V -MoS 2 due to the reduction of EG molecules during the preparation process.…”
Section: Resultsmentioning
confidence: 99%
“…The substrates enhance the reaction kinetics in several ways as follows: (1) by improving the distribution of 2D TMDCs, (2) by enhancing electrical conductivity, and (3) by improving structural stability during repeated cycles. 50–56 This has led to increased use of TMDC/C heterostructures for achieving improved reaction kinetics and electrochemical performance in both EES and EEC devices. 57 In the past few years, several reviews have summarized the progress of TMDC/C heterostructures for the application in EES or EEC devices, with emphasis on the preparation method, nanostructure design, and electrochemical performance improvement.…”
Section: Introductionmentioning
confidence: 99%