2018
DOI: 10.1021/acsphotonics.8b01464
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Monoisotopic Ensembles of Silicon-Vacancy Color Centers with Narrow-Line Luminescence in Homoepitaxial Diamond Layers Grown in H2–CH4[x]SiH4 Gas Mixtures (x = 28, 29, 30)

Abstract: Silicon-vacancy (SiV–) color center in diamond is of high interest for applications in nanophotonics and quantum information technologies, as a single photon emitter with excellent spectral properties. To obtain spectrally identical SiV– emitters, we doped homoepitaxial diamond films in situ with 28Si, 29Si, and 30Si isotopes using isotopically enriched (>99.9%) silane SiH4 gas added in H2–CH4 mixtures in the course of the microwave plasma-assisted chemical vapor deposition process. Zero-phonon line components… Show more

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Cited by 31 publications
(28 citation statements)
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“…Up to date, most coherent control experiments for split‐vacancy centers are implemented on SiV − color center, mainly due to its early identification and mature fabrication techniques, including ion implantation, and chemical vapor deposition (CVD) growth via deliberately doping with silane or via silicon contamination . Similarly, GeV − color center can also be created via ion implantation or via high‐pressure high‐temperature (HPHT) synthetic process .…”
Section: Coherent Control Of Xv− Color Centermentioning
confidence: 99%
“…Up to date, most coherent control experiments for split‐vacancy centers are implemented on SiV − color center, mainly due to its early identification and mature fabrication techniques, including ion implantation, and chemical vapor deposition (CVD) growth via deliberately doping with silane or via silicon contamination . Similarly, GeV − color center can also be created via ion implantation or via high‐pressure high‐temperature (HPHT) synthetic process .…”
Section: Coherent Control Of Xv− Color Centermentioning
confidence: 99%
“…laser absorption and/or optical emission spectroscopy measurements [6][7][8][9] of the densities of selected gas phase species in their ground and/or excited states) and complementary plasma modelling. [6][7][8]10 Silicon is a common trace element in CVD-grown diamond, [11][12][13][14][15][16][17][18] arising either adventitiouslyby etching from the silicon substrate on which diamond is commonly grown or from silica windows or walls of the MW reactor during hydrogen termination and/or growth of diamondor by design if, for example, SiH4 is added to the process gas mixture. The silicon-vacancy (SiV) defect, wherein a Si atom is located in a site within the diamond lattice corresponding to two missing carbon atoms (i.e.…”
Section: Introductionmentioning
confidence: 99%
“…An efficient way of meeting this requirement is to dope sufficient Si atoms or SiV centers in diamonds, utilizing a silicon-containing gas precursor. [11,12] However, due to the large refractive index (about 2.4) of diamonds as well as the formation of sp 2 amorphous carbon or graphite phase, efficient PL extraction of color centers in polycrystalline diamond films remains a challenge. [13][14][15][16] Numerous approaches have been proposed to improve the PL emission of color centers.…”
mentioning
confidence: 99%