2021
DOI: 10.3390/ma14164749
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Monitoring Electrical Biasing of Pb(Zr0.2Ti0.8)O3 Ferroelectric Thin Films In Situ by DPC-STEM Imaging

Abstract: Increased data storage densities are required for the next generation of nonvolatile random access memories and data storage devices based on ferroelectric materials. Yet, with intensified miniaturization, these devices face a loss of their ferroelectric properties. Therefore, a full microscopic understanding of the impact of the nanoscale defects on the ferroelectric switching dynamics is crucial. However, collecting real-time data at the atomic and nanoscale remains very challenging. In this work, we explore… Show more

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Cited by 6 publications
(6 citation statements)
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“…However, the structural details obtained at high magnification indicate that a high beam density (dose rate) (see Section 4.1) should be performed, leading to a strong beam effect. Meanwhile, the morphology and [27] Copyright 2021, Multidisciplinary Digital Publishing Institute. Reproduced with permission.…”
Section: Imaging Techniquesmentioning
confidence: 99%
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“…However, the structural details obtained at high magnification indicate that a high beam density (dose rate) (see Section 4.1) should be performed, leading to a strong beam effect. Meanwhile, the morphology and [27] Copyright 2021, Multidisciplinary Digital Publishing Institute. Reproduced with permission.…”
Section: Imaging Techniquesmentioning
confidence: 99%
“…Reproduced with permission. [ 27 ] Copyright 2021, Multidisciplinary Digital Publishing Institute. Reproduced with permission.…”
Section: Introductionmentioning
confidence: 99%
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“…Result.-Specimen device adapted to operando electron holography: To this end, along with other groups [26][27][28][29][30][31], we have been developing the fabrication of what we call "specimen devices" (Fig. 1): an operational device that is both electron transparent and contacted on a chip for biasing in situ without the need of a nanoprobe [32].…”
mentioning
confidence: 99%
“…The specimen is prepared in a parallel plate capacitor configuration (Figure 1) on dedicated chips with patterned electrodes processed by focused ion beam (FIB) with gallium ion source. The capacitor-like device has the advantage of creating homogeneous electric field compared to other TEM voltage bias in situ techniques configurations, such as probe techniques [2][3]. While sample preparation with FIB can be challenging, targeting atomic resolution makes it particularly meticulous.…”
mentioning
confidence: 99%