2005
DOI: 10.4028/www.scientific.net/msf.498-499.587
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Molybdenum Silicides as a Bonding Phase in Diamond Composites

Abstract: Molybdenum silicides were obtained by the self-propagating synthesis (SHS) method. Diamond composites containing 30 mass% of MoSi2 or Mo5Si3 bonding phase had been prepared using HT-HP Bridgman type apparatus. Sintering of the diamond composites were carried out at 2073±50 K and 8±0.2 GPa. The interactions in diamond-silicide composites were studied by means of X-ray diffractometry and transmission electron microscopy (TEM). Results of both mechanical properties and thermal resistance measurements are reported… Show more

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Cited by 6 publications
(9 citation statements)
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“…Sintered on the Ti 3 SiC 2 base, diamond composite cylindrical tools made by this method, can have even up to a dozen or so millimeters in diameter. Jaworska et al (2001) described the method of making such tools in their work. The tools had to be fitted into special holders.…”
Section: Methodsmentioning
confidence: 99%
“…Sintered on the Ti 3 SiC 2 base, diamond composite cylindrical tools made by this method, can have even up to a dozen or so millimeters in diameter. Jaworska et al (2001) described the method of making such tools in their work. The tools had to be fitted into special holders.…”
Section: Methodsmentioning
confidence: 99%
“…3. D-MAX95 -experimental polycrystalline diamond material where the bonding of diamond is realized via decomposition of Ti3SiC2 MAX-phase during the sintering, release of TiC, elemental silicon and titanium and their subsequent reaction with the diamond [9]. Mixture of 95 vol.% diamond and 5 vol.% Ti3SiC2 was subjected to the sintering process ( Fig.…”
Section: Methodsmentioning
confidence: 99%
“…Vc = 150 m/min. Warunki procesu nagniatania ślizgowego kompozytem diamentowych z ceramiczną fazą wiążącą Ti3SiC2 [26,27], który jest wytwarzany w IZTW dobrano w oparciu o wcześniejsze badania optymalizacyjne [28]. Wyniki tych badań pozwoliły na określenie najkorzystniejszych parametrów wpływających na wygładzenie powierzchni nagniatanej przy posuwie f = 0,02 mm/obr.…”
Section: Nagniatanie Wspomagane Obróbką Cieplno-chemicznąunclassified