Molecular Lithography through DNA-Mediated Etching and Masking of SiO<sub>2</sub>

Surwade, Sumedh P.; Zhao, Shichao; Liu, Haitao

doi:10.1021/ja2038886

Cited by 90 publications

(110 citation statements)

References 25 publications

(32 reference statements)

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“…While an individual origami can serve as a template for up to 200 small devices, typically only a single multi-component electronic or optical device is constructed 10,12 . For many technological applications it would be desirable to organize origami into periodic arrays, for example, to allow wiring of electronic devices together, to create cooperative optical effects as seen in optical metasurfaces 17 , to create DNA 'etch masks' 18,19 or to enable easier extraction of single-molecule biophysical data 9,20 .…”

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confidence: 99%

Self-assembly of two-dimensional DNA origami lattices using cation-controlled surface diffusion

2014

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DNA origami has proven useful for organizing diverse nanoscale components into patterns with 6 nm resolution. However for many applications, such as nanoelectronics, large-scale organization of origami into periodic lattices is desired. Here, we report the self-assembly of DNA origami rectangles into two-dimensional lattices based on stepwise control of surface diffusion, implemented by changing the concentrations of cations on the surface. Previous studies of DNA-mica binding identified the fractional surface density of divalent cationsñ s2 ð Þ as the parameter which best explains the behaviour of linear DNA on mica. We show that for n s2 between 0.04 and 0.1, over 90% of DNA rectangles were incorporated into lattices and that, compared with other functions of cation concentration,ñ s2 best captures the behaviour of DNA rectangles. This work shows how a physical understanding of DNA-mica binding can be used to guide studies of the higher-order assembly of DNA nanostructures, towards creating large-scale arrays of nanodevices for technology.

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Self-assembly of two-dimensional DNA origami lattices using cation-controlled surface diffusion

2014

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“…Specifically, the mechanism of the modulation effect of DNA has not been firmly established, although it was hypothesized that adsorption of water vapor on the surface plays an important role. 24 In addition, the kinetic behavior of the reaction has not been extensively explored, and consequently, the reaction conditions for pattern transfer have not been optimized for high resolution and contrast. As a result, the pattern transfer typically produced trenches (ridges) that are only 2−3 nm in depth (height).…”

Section: ■ Introductionmentioning

confidence: 99%

“…As a result, the pattern transfer typically produced trenches (ridges) that are only 2−3 nm in depth (height). 24 For practical applications, a much higher vertical contrast is needed. In a similar vein, the lateral resolution of the pattern transfer was limited to ∼17 nm.…”

Section: ■ Introductionmentioning

confidence: 99%

“…24,25 In one of the studies, DNA was shown to have a local effect on the vapor phase HF etching, which resulted in direct negative-tone and positive-tone pattern transfers from DNA to SiO 2 . 24 The fact that DNA can be used to directly pattern SiO 2 carries significant technological significance because SiO 2 is one of the most important hard mask materials for semiconductor nanofabrication. 26 Although our early study established vapor phase HF etching as a promising approach to pattern transfer to SiO 2 , several important scientific and technical questions were left unanswered.…”

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confidence: 99%

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Mechanistic Study of the Nanoscale Negative-Tone Pattern Transfer from DNA Nanostructures to SiO₂

et al. 2015

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We report a mechanistic study of a DNA-mediated vapor phase HF etching of SiO 2 . The kinetics of SiO 2 etching was studied as a function of the reaction temperature, time, and partial pressures of H 2 O, HF, and 2-propanol. Our results show that DNA locally increases the etching rate of SiO 2 by promoting the adsorption of water and that the enhancement effect mostly originates from the organic components of DNA. On the basis of the mechanistic studies, we identified conditions for high-contrast (>10 nm deep), high-resolution (∼10 nm) pattern transfers to SiO 2 from DNA nanostructures as well as individual double-stranded DNA. These SiO 2 patterns were used as a hard mask for plasma etching of Si to produce even higher-contrast patterns that are comparable to those obtained by electron-beam lithography. ■ INTRODUCTIONIn recent years, research in DNA nanostructures has developed to a stage in which arbitrarily shaped and mechanically robust nanostructure can be constructed 1−8 with a theoretical precision of <5 nm at a cost as low as $6/m 2 . 9 The deposition of DNA nanostructures on the substrates has been demonstrated with precise control over their location and orientation, making them ideal templates for high-resolution, low-cost nanofabrication. 10−12 However, the pattern transfer from DNA nanostructures to inorganic substrates remains a bottleneck of this area of research. Tremendous efforts were dedicated to overcome the lack of chemical stability of DNA and the inadequate adhesion interaction between DNA and the substrate. 13 Metallization is the most widely used approach to DNAbased nanofabrication. Solution phase metallization of λ-DNA was first demonstrated by Sivan and co-workers. 14 Recently, the metallization of different metals, such as Ag, Cu, Ni, and Au, on DNA strands and DNA nanostructures has been demonstrated. 2,15−17 In addition to the deposition of metal onto the whole nanostructure, site-specific metallization was also made possible by modifying DNA nanostructure with binding sites that accept DNA-modified Au or Ag nanoparticles. 18−20 In addition to these solution phases approaches, vapor phase deposition of metals onto DNA has also been reported by the groups of Mao and Woolley. They used DNA to pattern vapor phase deposited metal, and the resulting metal film can be used as a hard mask for patterning the underlying substrate. 21−23 Our group recently showed that DNA nanostructures can modulate certain surface reactions to produce a faithful pattern transfer from the DNA nanostructures to an inorganic substrate. 24,25 In one of the studies, DNA was shown to have a local effect on the vapor phase HF etching, which resulted in direct negative-tone and positive-tone pattern transfers from DNA to SiO 2 . 24 The fact that DNA can be used to directly pattern SiO 2 carries significant technological significance because SiO 2 is one of the most important hard mask materials for semiconductor nanofabrication. 26 Although our early study established vapor phase HF etching as a promising appr...

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“…In this way, DNA metallization is limited in its ability to construct nanoelectronic devices 40 . DNA nanostructures have also been used as shadow masks for metal deposition 41 and SiO 2 etching [42][43][44] . However, unprotected DNA masks degrade under plasma exposure, hindering their use for nanolithography.…”

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Metallized DNA nanolithography for encoding and transferring spatial information for graphene patterning

et al. 2013

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The vision for graphene and other two-dimensional electronics is the direct production of nanoelectronic circuits and barrier materials from a single precursor sheet. DNA origami and single-stranded tiles are powerful methods to encode complex shapes within a DNA sequence, but their translation to patterning other nanomaterials has been limited. Here we develop a metallized DNA nanolithography that allows transfer of spatial information to pattern two-dimensional nanomaterials capable of plasma etching. Width, orientation and curvature can be programmed by specific sequence design and transferred, as we demonstrate for graphene. Spatial resolution is limited by distortion of the DNA template upon Au metallization and subsequent etching. The metallized DNA mask allows for plasmonic enhanced Raman spectroscopy of the underlying graphene, providing information on defects, doping and lattice symmetry. This DNA nanolithography enables wafer-scale patterning of two-dimensional electronic materials to create diverse circuit elements, including nanorings, three-and four-membered nanojunctions, and extended nanoribbons.

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Molecular Lithography through DNA-Mediated Etching and Masking of SiO₂

Abstract: We demonstrate a new approach to pattern transfer for bottom-up nanofabrication. We show that DNA promotes/inhibits the etching of SiO(2) at the single-molecule level, resulting in negative/positive tone pattern transfers from DNA to the SiO(2) substrate.

Cited by 90 publications

References 25 publications

Self-assembly of two-dimensional DNA origami lattices using cation-controlled surface diffusion

Self-assembly of two-dimensional DNA origami lattices using cation-controlled surface diffusion

Mechanistic Study of the Nanoscale Negative-Tone Pattern Transfer from DNA Nanostructures to SiO₂

Metallized DNA nanolithography for encoding and transferring spatial information for graphene patterning

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Molecular Lithography through DNA-Mediated Etching and Masking of SiO2

Abstract: We demonstrate a new approach to pattern transfer for bottom-up nanofabrication. We show that DNA promotes/inhibits the etching of SiO(2) at the single-molecule level, resulting in negative/positive tone pattern transfers from DNA to the SiO(2) substrate.

Cited by 90 publications

References 25 publications

Self-assembly of two-dimensional DNA origami lattices using cation-controlled surface diffusion

Self-assembly of two-dimensional DNA origami lattices using cation-controlled surface diffusion

Mechanistic Study of the Nanoscale Negative-Tone Pattern Transfer from DNA Nanostructures to SiO2

Metallized DNA nanolithography for encoding and transferring spatial information for graphene patterning

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Product

Resources

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Molecular Lithography through DNA-Mediated Etching and Masking of SiO₂

Mechanistic Study of the Nanoscale Negative-Tone Pattern Transfer from DNA Nanostructures to SiO₂