2008
DOI: 10.1088/0953-8984/20/37/374117
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Molecular electronics using diazonium-derived adlayers on carbon with Cu top contacts: critical analysis of metal oxides and filaments

Abstract: Evaporation of Cu metal onto thin (less than 5 nm) molecular layers bonded to conductive carbon substrates results in electronic junctions with an ensemble of molecules sandwiched between two conductors. The resulting devices have previously been characterized through analysis of current density-voltage (j-V) curves for several different molecular layers and as a function of layer thickness. The approach represents an 'ensemble' rather than 'single molecule' technique, in which the electronic response represen… Show more

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Cited by 48 publications
(93 citation statements)
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“…[149,159,161,162] One approach postulates that if the applied bias is larger than the barrier height, the transport mechanism changes from direct tunneling to field-emission. [34,161,162] Experimentally, it is fairly simple to identify this transition bias (V T ) and indeed, in the study cited, [34,161,162] V T correlated well with the expected barrier height, the difference of the molecular level (highest occupied molecular orbital, HOMO) and the electrode Fermi level as deduced independently by UPS (see, however, Section 5.2). [52,161,162] This approach assumes a roughly linear J-V relation for tunneling transport [161] (i.e., positive ln(J/V 2 ) vs. 1/V slope), and in that case V T indeed indicates a change in transport mechanism to field-emission.…”
Section: Extracting Insulator Parameters From Current-density-voltagesupporting
confidence: 53%
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“…[149,159,161,162] One approach postulates that if the applied bias is larger than the barrier height, the transport mechanism changes from direct tunneling to field-emission. [34,161,162] Experimentally, it is fairly simple to identify this transition bias (V T ) and indeed, in the study cited, [34,161,162] V T correlated well with the expected barrier height, the difference of the molecular level (highest occupied molecular orbital, HOMO) and the electrode Fermi level as deduced independently by UPS (see, however, Section 5.2). [52,161,162] This approach assumes a roughly linear J-V relation for tunneling transport [161] (i.e., positive ln(J/V 2 ) vs. 1/V slope), and in that case V T indeed indicates a change in transport mechanism to field-emission.…”
Section: Extracting Insulator Parameters From Current-density-voltagesupporting
confidence: 53%
“…The upside is that it is more robust against substrate oxidation, can withstand heating [33] and that metal atom diffusion during top contact deposition is less likely. [34] Amongst other binding chemistries, only CÀC bonding to graphite (or burned photo-resist, see Ref. [34]) is comparable to the SiÀC or SiÀOÀC binding mode.…”
Section: Why Silicon? Semiconducting Versus Metallic Electrodesmentioning
confidence: 99%
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