Molecular Dynamics Study of Poly(dimethylsiloxane) Nanostructure Distortion in a Soft Lithography Demolding Process

Abstract

This study aims at investigating the distortion of poly(dimethylsiloxane) (PDMS) nanostructures in a soft lithography demolding process using molecular dynamics simulation. Experimental results show that after peeling, PDMS nanopillars became 10–60% longer in height than the mold size. Molecular dynamics simulations have been employed to plot the stress–strain curve of the nanopillars when subjected to uniaxial stress. Three force fields (COMPASS, CVFF, and PCFF) were used for modeling. The demolding process in soft lithography and nanoimprint lithography causes significant deformation in replication. The experimental results show clear signs of elongation after demolding. Molecular dynamics simulations are employed to study the stress–strain relationship of the PDMS nanopillars. The results from the simulation show that a PDMS nanopillar at temperature T = 300 K under tensile stress shows characteristics of flexible plastic under tensile stress and has a lower Young’s modulus, ultimate tensile stress, and Poisson’s ratio.

Dynamics Responses of Graphene Nanoplatelets‐Reinforced Polydimethylsiloxane Nanocomposites: A Molecular Dynamics Study

“…The Young's modulus of the PDMS model is estimated to be 41 MPa, as shown in Table 1 , which is within the 10–42.8 MPa range for the MD model as reported. [ 28,40–42 ] However, this value is large compared with the experimental results, [ 39,43,44 ] this is primarily caused by the ultrahigh tensile strain rate. [ 40,45,46 ] Generally, this result is within the range of previously reported MD simulation results and can be used for further simulation studies for quantitive analysis of the impact of nanoadditives.…”

“…Abdul [42] MD simulations the intensity of the shockwave after it had been attenuated was determined using the peak velocity of the shockwave as it rose to the top group of atoms (Figure 5b).…”

Development in Cell-Nanotopography Interaction Applications and Its Potential for Mass Production

“…Innovations like nanoimprint lithography (NIL) and electrospinning now empower researchers to construct and fabricate nanostructures on larger substrates at a more cost-effective rate [75]. NIL was first introduced by Chou in 1995 [76] demonstrating promising potential to offer a cost-effective and high-throughput method for producing continuous high-resolution nanostructures [77]. In NIL, the mold created is transferred onto a resist using specialized printing equipment [78].…”