“…The tfMC simulations were carried out using Δ = 0.2 Å, corresponding to a time step of 48.6 39.7, 34.3, and 30.7 fs at temperatures of 400, 600, 800, and 1000 K, respectively. Therefore, the growth rates for the CdTe homoepitaxial growth in the simulations are between ∼0.036 nm/ns to ∼0.055 nm/ns within the temperature range of 400 to 1000 K. Since MD and tfMC simulations are only capable of simulating time scales of the order of nanoseconds, the growth rates in this study are accelerated simulated growth rates, 34 which are orders of magnitude faster than the experimental growth rates of ∼1−3 μm/h. 16,21,50 Following the deposition of CdTe, all atoms except the fixed bottom two double-layers were cooled to 10 K over 350 ps using the Berendsen thermostat.…”