2019
DOI: 10.1088/1361-651x/ab50c7
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Molecular dynamics simulations of extended defects and their evolution in 3C–SiC by different potentials

Abstract: An important issue in the technology of cubic SiC (3C-SiC) material for electronic device applications is to understand the behavior of extended defects such as partial dislocation complexes and stacking faults. Atomistic simulations using molecular dynamics (MD) are an efficient tool to

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Cited by 19 publications
(14 citation statements)
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References 40 publications
(78 reference statements)
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“…The dynamics of the stability of partial dislocation complexes in 3C-SiC have been studied by molecular dynamics simulations using two empirical potentials that describe the interaction between the Si and C atoms. Namely, analytical bond order [18] and Vashishta potentials [19] have been applied as the most appropriate ones for the description of the behavior of extended defects in 3C-SiC material, in accordance with the results obtained in our previous publication [17]. As demonstrated in [17], MD simulations with both mentioned potentials predict qualitatively equal scenarios of extended defect evolution.…”
Section: Methodssupporting
confidence: 58%
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“…The dynamics of the stability of partial dislocation complexes in 3C-SiC have been studied by molecular dynamics simulations using two empirical potentials that describe the interaction between the Si and C atoms. Namely, analytical bond order [18] and Vashishta potentials [19] have been applied as the most appropriate ones for the description of the behavior of extended defects in 3C-SiC material, in accordance with the results obtained in our previous publication [17]. As demonstrated in [17], MD simulations with both mentioned potentials predict qualitatively equal scenarios of extended defect evolution.…”
Section: Methodssupporting
confidence: 58%
“…Namely, analytical bond order [18] and Vashishta potentials [19] have been applied as the most appropriate ones for the description of the behavior of extended defects in 3C-SiC material, in accordance with the results obtained in our previous publication [17]. As demonstrated in [17], MD simulations with both mentioned potentials predict qualitatively equal scenarios of extended defect evolution. At this, the Vashishta potential enables observation of the evolution of defects at much shorter time scales as compared to that obtained with ABOP, and is therefore used to greatly reduce the computation effort of simulations.…”
Section: Methodssupporting
confidence: 58%
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