2019
DOI: 10.1080/00268976.2019.1587025
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Molecular dynamics simulations of AlN deposition on GaN substrate

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Cited by 14 publications
(2 citation statements)
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“…Zhang et Al. [13] used MD method to explore the effects of GaN substrate surface, growth temperature and N:Al flux ratio on the surface morphology and crystallinity of AlN films. Although Liu et al [14] simulated the epitaxial growth of GaN film on AlN substrate and studied the effects of different Ga:N flux ratio and growth temperature on the crystal structure of the film, different substrate surface is an important factor affecting the growth of the film.…”
Section: Molecular Dynamics Simulation Of Thin Film Growthmentioning
confidence: 99%
“…Zhang et Al. [13] used MD method to explore the effects of GaN substrate surface, growth temperature and N:Al flux ratio on the surface morphology and crystallinity of AlN films. Although Liu et al [14] simulated the epitaxial growth of GaN film on AlN substrate and studied the effects of different Ga:N flux ratio and growth temperature on the crystal structure of the film, different substrate surface is an important factor affecting the growth of the film.…”
Section: Molecular Dynamics Simulation Of Thin Film Growthmentioning
confidence: 99%
“…One of the goals of this Special Issue has been to address the treatment of nuclear motions of clusters. Related applications include, for instance, the accurate description of highly excited (electronic as well as vibrational and rotational, bound and unbound) states of molecules and weakly bound aggregated systems as well as the dynamics of molecules adsorbed on nanostructures [17][18][19].…”
mentioning
confidence: 99%