Handbook of Crystal Growth 2015
DOI: 10.1016/b978-0-444-63304-0.00017-2
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Molecular Beam Epitaxy of Nitrides for Advanced Electronic Materials

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Cited by 2 publications
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“…Both the 11 20 ð Þ, a-, and 1 100 ð Þ, m-, surface The growth along the [0001] polar direction was preferred and better controlled for long time, but recently different approaches have been proposed to accomplish growth along different crystallographic directions and polarity by hydride vapor phase epitaxy, 27 metalorganic chemical vapor deposition, 28 or molecular beam epitaxy. 29 The GaN surfaces with different crystallographic orientations and polarities have different chemical stabilities due to their different bond arrangements, which requires different material processing. 30 In addition, it was also found that the different surface energies allow for different growth rates and impurity incorporation efficiencies.…”
Section: B Dependence On Gan Surface Polarity and Qualitymentioning
confidence: 99%
“…Both the 11 20 ð Þ, a-, and 1 100 ð Þ, m-, surface The growth along the [0001] polar direction was preferred and better controlled for long time, but recently different approaches have been proposed to accomplish growth along different crystallographic directions and polarity by hydride vapor phase epitaxy, 27 metalorganic chemical vapor deposition, 28 or molecular beam epitaxy. 29 The GaN surfaces with different crystallographic orientations and polarities have different chemical stabilities due to their different bond arrangements, which requires different material processing. 30 In addition, it was also found that the different surface energies allow for different growth rates and impurity incorporation efficiencies.…”
Section: B Dependence On Gan Surface Polarity and Qualitymentioning
confidence: 99%

Xps Study of the Nitridation of Hafnia on Silicon

Mayorga-Garay,
Cortazar-Martinez,
Torres-Ochoa
et al. 2024
Preprint