Molecular beam epitaxy of low defect density (⩽1×104 cm−2) ZnSSe on GaAs

Abstract

We study the growth of pseudomorphic ZnSSe layers on GaAs. The dependence of the epilayer quality on Zn exposure to the GaAs surface is investigated. Zn treatment prior to the ZnSe buffer growth on the As-rich GaAs surface results in the lowest defect density. Transmission electron microscopy studies show that an atomic scale smooth interface is formed. Based on the etch pit density and photoluminescence image analysis, ZnSSe layers with defect density ≤1×104 cm−2 can be reproducibly obtained.

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