2012
DOI: 10.1143/jjap.51.098003
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Molecular Beam Epitaxy of BaSi2 Films with Grain Size over 4 µm on Si(111)

Abstract: 100-nm-thick BaSi2 epitaxial films were grown on Si(111) substrates by a two-step growth method including reactive deposition epitaxy (RDE) and molecular beam epitaxy (MBE). The Ba deposition rate and duration were varied from 0.25 to 1.0 nm/min and from 5 to 120 min during RDE, respectively. Plan-view transmission electron micrographs indicated that the grain size in the MBE-grown BaSi2 was significantly dependent on the RDE growth conditions and was varied from approximately 0.2 to more than 4 µm.

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Cited by 25 publications
(21 citation statements)
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“…26 The domain size in BaSi 2 on Si(111) can be varied from 0.2 to 4.0 lm, while the domain size for BaSi 2 on Si(001) can vary from 1.0 to 9.0 lm. [27][28][29] With regard to domain size, therefore, the use of Si(001) is preferable because the number of domain boundaries (DBs) between the BaSi 2 epitaxial variants will decrease. However, L can be as low as 1.5 lm for undoped Published by AIP Publishing.…”
Section: Introductionmentioning
confidence: 99%
“…26 The domain size in BaSi 2 on Si(111) can be varied from 0.2 to 4.0 lm, while the domain size for BaSi 2 on Si(001) can vary from 1.0 to 9.0 lm. [27][28][29] With regard to domain size, therefore, the use of Si(001) is preferable because the number of domain boundaries (DBs) between the BaSi 2 epitaxial variants will decrease. However, L can be as low as 1.5 lm for undoped Published by AIP Publishing.…”
Section: Introductionmentioning
confidence: 99%
“…An air-stable BaSi 2 source can be used without any pretreatment, while the MBE uses a reactive Ba source and the sputtering method requires compacting the powder to make a target. It should also be noted that the deposition rate (300 nm/min) of the evaporation method is considerably higher than sputtering (30 nm/min [9]) and MBE (2 nm/min [12]).…”
Section: Introductionmentioning
confidence: 99%
“…17 The grain size in BaSi 2 can be controlled from 0.1 to 4 lm, according to the growth conditions. 20 Grain boundaries (GBs) in polycrystalline semiconductors often degrade their electrical and optical properties. However, Kelvin probe force microscopy measurements indicate that the band structure at BaSi 2 GBs leads to repulsion of the minority carriers, [21][22][23] which reduces the charge carrier recombination at GBs.…”
mentioning
confidence: 99%