PACS : 71.55.Eq; 78.66.Fd; 81.15.Hi; 82.70.Uv In this work, we have investigated the effect of atomic H irradiation on the thin-film growth of GaNAs and GaInNAs by RF-molecular beam epitaxy from the viewpoint of growth dynamics and crystal quality. The crystal quality of Ga(In)NAs was mainly characterized by X-ray diffraction and the surface morphology was characterized by using atomic force microscope. The atomic H irradiation during the growth of GaNAs and GaInNAs in RF-molecular beam epitaxy was found to be effective in improving the overall quality of these epilayers. Further, it was found that atomic H irradiation has an effect of suppressing the three-dimensional growth thereby promoting a twodimensional growth as well as is effective in passivating the defects and suppressing the phase separation. These results should bring further improvements of novel structures that require abrupt interfaces in GaNAs and GaInNAs based devices.Introduction GaNAs and GaInNAs are the representative III-V-N semiconductors, which have strongly sublinear bandgap energy dependence between GaAs and GaN with a much larger alloy bandgap bowing parameter than for any other ternary semiconductors. Recently, GaNAs and GaInNAs have been popularly investigated as new material systems for long wavelength devices fabricated on GaAs substrates such as lasers emitting at the optical-fiber communication wavelength window (1.3-1.55 mm). The application of GaInNAs in the active region should result in lasers with a high characteristic temperature T 0 , and GaInNAs lasers with high characteristic T 0 have already been realized [1,2]. For multi-junction GaInP 2 /GaAs/GaInNAs/Ge solar cells, GaInNAs can be lattice matched to GaAs and tuned in its bandgap to around 1.0 eV, which is an optimized bandgap to achieve the highest efficiencies [3][4][5]. However, in comparison the optical quality of GaInNAs is generally inferior to that of conventional III-V semiconductor materials without N, such as InGaAs. At higher N concentrations which exhibit a strong red shift, the crystal quality of Ga(In)NAs is degraded, but the physical origin of which is not fully understood. The hydrogen species are thought to cause a quenching of PL intensity in as-grown GaInNAs since a large amount of hydrogen are incorporated in gas-source molecular beam epitaxy (GS-MBE) [6], metal organic chemical vapor deposition (MOCVD) [7], and chemical beam epitaxy (CBE) [8,9].In this work, we show that irradiation of atomic H during the growth of GaNAs and GaInNAs in RF-molecular beam epitaxy (MBE) improves the quality of these materials. We have previously shown that the irradiation of atomic H during GaAs [10], and GaN [11] growths in MBE significantly improves the crystal quality of the films. As a continuing effort, we have investigated the effects of atomic H irradiation on growth dynamics and crystal quality.