2014
DOI: 10.11648/j.optics.20140304.12
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Molecular Aggregations and Anisotropy Photoinduction in Organic Compounds

Abstract: The work is dedicated to a study of anisotropy photoinduction during the light-stimulated molecular aggregations in organic compounds. The case of gelatin or polyvinyl films saturated by azo dyes is considered. By using the video and spectral techniques, the time-formation picture of optical image is studied. It is shown that in this case the image is formed in a similar way as in silver emulsions in the process of photographing-"with the grain distribution".

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Cited by 2 publications
(4 citation statements)
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“…In the work [11], in the polyvinyl film saturated by dye "Mordant Pure Yellow" (MPY) anisotropy photoinduction in the "granulouos" form has been observed; and the obtained anisotropy integral area through the active light exposition was modulated; there weren't aggregates at the beginning and we had a total isotropic starting picture.…”
Section: Introductionmentioning
confidence: 95%
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“…In the work [11], in the polyvinyl film saturated by dye "Mordant Pure Yellow" (MPY) anisotropy photoinduction in the "granulouos" form has been observed; and the obtained anisotropy integral area through the active light exposition was modulated; there weren't aggregates at the beginning and we had a total isotropic starting picture.…”
Section: Introductionmentioning
confidence: 95%
“…To obtain a clear effect, it is necessary that the dye concentration in the solution is as high as possible. However, the high amount of dye concentration in solutions unconditionally leads us to self-induction of the dye molecules' aggregates in solid films, or leads to such state when aggregates are induced by light stimulation [2,[5][6][7][8][9][10][11].…”
Section: Introductionmentioning
confidence: 99%
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“…The organic materials technology offers simple methods of the device manufacturing, including inkjet printing, roll-to-roll printing or non-hydrolytic sol-gel process that promise very low cost electronic products against the lithography methods in silicon technology [1][2][3].…”
Section: Introductionmentioning
confidence: 99%