1997 Proceedings 47th Electronic Components and Technology Conference
DOI: 10.1109/ectc.1997.606151
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Molding compounds for high breakdown voltage applications on power IC semiconductors

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Cited by 18 publications
(3 citation statements)
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“…[1][2][3][4] The reason for utilizing high filler contents are three folded; (1) to decrease the mechanical stresses on die; match the mechanical properties of silicon (i.e., thermal expansion stress reduction); (2) to have low enough permittivity and electrical conductivity to control the electric field above the active device with least ionic mobility; and (3) cost; semiconductor grade thermosets resins are expensive and cost reduction is achieved by using high amounts of inorganic fillers (up to 91% in weight), see Fig. 1.…”
Section: Introductionmentioning
confidence: 99%
“…[1][2][3][4] The reason for utilizing high filler contents are three folded; (1) to decrease the mechanical stresses on die; match the mechanical properties of silicon (i.e., thermal expansion stress reduction); (2) to have low enough permittivity and electrical conductivity to control the electric field above the active device with least ionic mobility; and (3) cost; semiconductor grade thermosets resins are expensive and cost reduction is achieved by using high amounts of inorganic fillers (up to 91% in weight), see Fig. 1.…”
Section: Introductionmentioning
confidence: 99%
“…More specifically, high-voltage lateral devices, like, e.g., double-diffused DMOS (LDMOS) transistors, are based on the Reduced Surface Field (RESURF) principle [4] to significantly improve the breakdown voltage. But the performance of this class of devices is sensitive to the optimum charge balance in the drift region, which is in general at the silicon surface, and thus it is strongly impacted by mobile charges accumulated in the overlying isolation and mold-compound passivation on top [5]. For this reason, additional metal and/or poly-silicon field-plates and floating-rings are required to stabilize the surface electric field [6,7], even if they might limit the maximum intrinsic performance of the device.…”
Section: Introductionmentioning
confidence: 99%
“…These species may be formed even locally on the AlSi, AlSiCu surfaces due, for instance, to water penetration through the package and molding compound during accelerated reliability humidity test. 2,3 The Al film is normally covered with a thin ͑3-4 nm͒ native oxide-hydroxide layer which prevents the underlying metal from being further corroded in normal atmosphere. Traces of chemical species coming from molding compounds or introduced during the die fabrication can alter the oxide-hydroxide layer and favor further oxidation.…”
mentioning
confidence: 99%