2007
DOI: 10.1021/nl071844k
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Moiré Patterns in Superimposed Nanoporous Thin Films Derived from Block-Copolymer Assemblies

Abstract: Nanoscale rotation moiré patterns are observed in double-layer nanoporous thin films produced with use of block-copolymer self-assembly. Periodic hexagonal moiré superstructures appear when the films possessing long-range order are superimposed at small misorientation angles. Overlapping films misoriented by angles close to 30°generate aperiodic quasi-crystal-like superstructures with 5-fold symmetries. The stacking of the disordered nanoporous films produces labyrinth-like patterns. Block-copolymer moiré supe… Show more

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Cited by 48 publications
(59 citation statements)
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“…The SMA were composed of 2-(4 0 -hydroxybenzeneazo) benzoic acid (HABA) as the low molecular weight additive and polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) as the diblock copolymer. [56][57][58][59][60] Since the cylindrical morphology adopted in the thin films of these SMA could easily be switched from parallel to perpendicular and vice-versa by annealing in the vapor of appropriate solvents, it was possible to fabricate highly ordered palladium nanodots or nanowires from the same system. Moreover, the use of a strongly segregated block copolymer system (PS-b-P4VP) allowed the fabrication of nanopatterns with sub-30-nm periodicity which, to the best of our knowledge, is one of the smallest obtained using block copolymer templates.…”
Section: Introductionmentioning
confidence: 99%
“…The SMA were composed of 2-(4 0 -hydroxybenzeneazo) benzoic acid (HABA) as the low molecular weight additive and polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) as the diblock copolymer. [56][57][58][59][60] Since the cylindrical morphology adopted in the thin films of these SMA could easily be switched from parallel to perpendicular and vice-versa by annealing in the vapor of appropriate solvents, it was possible to fabricate highly ordered palladium nanodots or nanowires from the same system. Moreover, the use of a strongly segregated block copolymer system (PS-b-P4VP) allowed the fabrication of nanopatterns with sub-30-nm periodicity which, to the best of our knowledge, is one of the smallest obtained using block copolymer templates.…”
Section: Introductionmentioning
confidence: 99%
“…The simulated MoirØ pattern from the FFT is also been shown in Figure 3 Although MoirØ fringes are very common and are supposed to be obtained at the overlapping regions of two sheets or platelets, we observed here practically the same with several interesting patterns. To our knowledge, the case here is unique among previous reports on MoirØ fringes [28,[36][37][38] and we assume this to be because of the highly crystalline nature of the platelets. It has been observed that these platelets are associated with several important and useful materials properties.…”
mentioning
confidence: 51%
“…Moirépatterns from TEM images of superimposed block copolymer thin films have been reported 7 to 8 years ago, and their possible use in nanolithography was contemplated. 31 Figure 6 shows SEM images of nanostructured silicon under a nanoporous mask area with a well-defined fold. The low-magnification SEM image in Figure 6a allows us to characterize the fold, as shown in Figure 6b.…”
Section: ■ Results and Discussionmentioning
confidence: 99%