Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV 2021
DOI: 10.1117/12.2585876
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Moiré effect-based Overlay target design for OPO improvements

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Cited by 4 publications
(3 citation statements)
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“…Spielberg does not just start his films, whereby he prefers to use a production design like a prop or piece on the set that serves to put the audience in the context of the film instead of just throwing them into it. In all his best films, he starts the film itself by presenting the audience with production design elements so that they can appreciate the visual elements of the setting before they can dive into the narrative [4]. By so doing, the audience receives a visual reset so that they can know that a new set is starting, which makes his films episodic and easy to follow for the audience.…”
Section: Discussionmentioning
confidence: 99%
“…Spielberg does not just start his films, whereby he prefers to use a production design like a prop or piece on the set that serves to put the audience in the context of the film instead of just throwing them into it. In all his best films, he starts the film itself by presenting the audience with production design elements so that they can appreciate the visual elements of the setting before they can dive into the narrative [4]. By so doing, the audience receives a visual reset so that they can know that a new set is starting, which makes his films episodic and easy to follow for the audience.…”
Section: Discussionmentioning
confidence: 99%
“…OVL accuracy improvement is an endless quest to support OPO reduction which is heading to sub 2nm OPO. Imagingbased OVL (IBO) has made significant accuracy improvements in the last years with the introduction of new metrology tool capabilities coupled with new OVL targets such as robust AIM (rAIM ® ) and color per layer AIM (CPL AIM) [3]- [8]. Both of these OVL targets are optimized in the initial technology development phase and implemented in high-volume manufacturing (HVM).…”
Section: Introductionmentioning
confidence: 99%
“…These periodic patterns with enhanced information content are robust to process variation and could be optimized per process layer [3]- [4]. rAIM targets, shown in Figure 1, utilize a smaller pitch compared to AIM targets which typically leads to a more device-like pattern and improves the process compatibility and robustness, lowers the residual, and has better accuracy [5]- [8]. Small pitch AIM (sAIM ™ ) is another IBO OVL target to support metrology measurements.…”
Section: Introductionmentioning
confidence: 99%