Modulation of optical intensity on curved surfaces and its application to fabricate DOEs with arbitrary profile by interference

Abstract

We demonstrate a novel method for the modulation of the optical intensity on curved surfaces (CS) by interference and apply it to fabricate diffractive optical elements (DOEs) with arbitrary profile and large area on CS. The intensity on CS is modulated accurately by two phase distributions. Both a binary pattern and a gray pattern are reconstructed numerically on the lens surfaces with big curvatures in large areas, while a binary and non-periodic pattern is produced experimentally on a lens surface with a radius of curvature in 25.8 mm. The simulations together with the experiment demonstrate the validity of the method. To our knowledge, it is the first time to present an approach for fabricating DOEs with arbitrary profile and large area on CS by interference.

Design and application of diffractive optical element: a review

“…Among them, masked technologies often have problems with long processing cycles and high costs, and processing technologies that require projection systems often have problems such as expensive equipment and the need to correct errors; The method of point by point writing in maskless mode usually has the problem of long writing time. In addition, laser interference lithography (also known as holographic interference lithography) can be used for the production of aperiodic structures, especially for the processing of DOEs designed based on interference principles [2][3][4][5][6].…”