Modulation of iron–nickel layers composition by an external magnetic field

The Effect of a Substrate Material on Composition Gradients of Fe-Ni Films obtained by Electrodeposition

“…Three different substrates were used to study the properties of the FeNi layers deposited electrochemically on them [19][20][21][22] . All solutions were prepared using deionized water and the following chemicals: 15% [23][24][25] . The magnets were magnetized perpendicularly to the magnet's larger surface (75•10 −3 m × 50•10 −3 m) and B (II and _I_) was oriented like the x-axis in the Cartesian coordinate system.…”

“…The value of the magnetic field strength varied according to the distance from the magnet and ranged from 80•10 −3 T to 20•10 −2 T (with an accuracy of ± 2%). In the area of conducting experiments, the magnetic field was uniform and the temperature was set at 294.15 ± 1 K. The process was performed galvanostatically by means of a potentiostat/galvanostat instrument (Matrix MPS-7163) [23][24][25][26] . The Scanning Electron Microscope (SEM) was used to investigate the surface morphology of the samples.…”

Normal Electrochemical Deposition NiFe

“…Summing up the results of the analysis of chemical characteristics of hydrolysis of ferric chloride, it should be noted that researchers in over 65 years [2] conducted NiFe alloy plating and receive preferential deposition of iron in relation to nickel in all formulations electrolyte. Electrolytes used [15][16][17][18][19][20][21][22][23][24][25][26][27][28][29][30] is characterized by a wide range of molar relationship of nickel and iron. The cause of the anomalous codeposition of preferential deposition of iron sources previously not associated with the main feature of iron ionsthe existence of variable Valence iron one and two values in the charge of ions during the hydrolysis of iron salts.…”

Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition

“…11 So far, Ni 80 Fe 20 films have been mostly obtained by physical vapor deposition (PVD) methods, like sputtering, 12,13 electron beam evaporation and molecular beam epitaxy. 14 Other routes are electrodeposition, [15][16][17][18] spray coating and micromolding. 19 The PVD techniques are well suited for the production of planar nanostructures.…”