Modular deposition chamber for<i>in situ</i>X-ray experiments during RF and DC magnetron sputtering

Krause, B.; Darma, Susan; Kaufholz, Marthe; Gräfe, Hans Hellmuth; Ulrich, S.; Mantilla, M.; Weigel, Ralf; Rembold, Steffen; Baumbach, Tilo

doi:10.1107/s0909049511052320

Cited by 25 publications

(26 citation statements)

References 24 publications

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“…An advantage of the method is that it can be combined with simultaneous in situ XRD measurements under grazing incidence [23], thus giving information not only about the time-dependent material distribution but also about the crystal growth.…”

Section: Discussionmentioning

confidence: 99%

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Angle-resolved X-ray reflectivity measurements during off-normal sputter deposition of VN

Krause

Kaufholz

Kotapati

et al. 2015

Surface and Coatings Technology

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Section: Discussionmentioning

confidence: 99%

“…Details about the in situ deposition chamber are given in Ref. [23]. The 20 × 20 × 1 mm 3 silicon [100] substrates were covered by natural oxide.…”

Section: Methodsmentioning

confidence: 99%

Angle-resolved X-ray reflectivity measurements during off-normal sputter deposition of VN

Krause

Kaufholz

Kotapati

et al. 2015

Surface and Coatings Technology

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“…This has been recognised in the growing application of synchrotron radiation to real-time measurements of vacuum-deposited thin films fabricated with a wide range of deposition techniques including sputtering, [11][12][13][14] chemical vapour deposition, 15 molecular beam epitaxy, 16,17 and organic vapor-jet deposition. 18 Such scattering measurements are complementary to local structure measurements with AFM, as the elongated footprint of the X-ray beam at grazing angles probes the statistical average structure over a large area.…”

Section: Scientific Motivation and Backgroundmentioning

confidence: 99%

MINERVA: A facility to study Microstructure and INterface Evolution in Realtime under VAcuum

Nicklin

Hardigree

Warne

et al. 2017

Review of Scientific Instruments

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A sample environment to enable real-time X-ray scattering measurements to be recorded during the growth of materials by thermal evaporation in vacuum is presented. The in situ capabilities include studying microstructure development with time or during exposure to different environmental conditions, such as temperature and gas pressure. The chamber provides internal slits and a beam stop, to reduce the background scattering from the X-rays passing through the entrance and exit windows, together with highly controllable flux rates of the evaporants. Initial experiments demonstrate some of the possibilities by monitoring the growth of bathophenanthroline (BPhen), a common molecule used in organic solar cells and organic light emitting diodes, including the development of the microstructure with time and depth within the film. The results show how BPhen nanocrystal structures coarsen at room temperature under vacuum, highlighting the importance of using real time measurements to understand the as-deposited pristine film structure and its development with time. More generally, this sample environment is versatile and can be used for investigation of structure-property relationships in a wide range of vacuum deposited materials and their applications in, for example, optoelectronic devices and energy storage.

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“…It allows bottom-up fabrication of designed compounds and morphologies with tailored catalytic, optical, or magnetic properties. [5][6][7][8][9][10][11][12][13] Radio Frequency (RF) sputter deposition is an industrial process extensively used to deposit thin films and, complementary to Direct Current (DC) sputter deposition, it allows to deposit both conducting and non-conducting materials. 14 In order to better control and optimize the deposition process, it is essential to understand the kinetic phenomena involved in the thin film formation.…”

Section: Introductionmentioning

confidence: 99%

A new highly automated sputter equipment for in situ investigation of deposition processes with synchrotron radiation

Döhrmann

Botta

Buffet

et al. 2013

Review of Scientific Instruments

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HASE (Highly Automated Sputter Equipment) is a new mobile setup developed to investigate deposition processes with synchrotron radiation. HASE is based on an ultra-high vacuum sputter deposition chamber equipped with an in-vacuum sample pick-and-place robot. This enables a fast and reliable sample change without breaking the vacuum conditions and helps to save valuable measurement time, which is required for experiments at synchrotron sources like PETRA III at DESY. An advantageous arrangement of several sputter guns, mounted on a rotative flange, gives the possibility to sputter under different deposition angles or to sputter different materials on the same substrate. The chamber is also equipped with a modular sample stage, which allows for the integration of different sample environments, such as a sample heating and cooling device. The design of HASE is unique in the flexibility. The combination of several different sputtering methods like standard deposition, glancing angle deposition, and high pressure sputter deposition combined with heating and cooling possibilities of the sample, the large exit windows, and the degree of automation facilitate many different grazing incidence X-ray scattering experiments, such as grazing incidence small and wide angle X-ray scattering, in one setup. In this paper we describe in detail the design and the performance of the new equipment and present the installation of the HASE apparatus at the Micro and Nano focus X-ray Scattering beamline (MiNaXS) at PETRA III. Furthermore, we describe the measurement options and present some selected results. The HASE setup has been successfully commissioned and is now available for users.

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Modular deposition chamber forin situX-ray experiments during RF and DC magnetron sputtering

Cited by 25 publications

References 24 publications

Angle-resolved X-ray reflectivity measurements during off-normal sputter deposition of VN

Angle-resolved X-ray reflectivity measurements during off-normal sputter deposition of VN

MINERVA: A facility to study Microstructure and INterface Evolution in Realtime under VAcuum

A new highly automated sputter equipment for in situ investigation of deposition processes with synchrotron radiation

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