Modifying magnetization behavior of magnetic films utilizing surface grooved grating patterns

Mu, Yimin; Li, Ping; Wen, Yumei; Yu, Shumin; Wang, Yao; Bian, Liujiao; Han, Tao; Ji, Xiaojun

doi:10.1016/j.jmmm.2021.168025

Cited by 7 publications

(2 citation statements)

References 55 publications

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“…The quality characteristics of deposition factors were determined by the S/N ratios. The S/N ratios were computed using the "larger is the better" condition, i.e., (1), and are presented in Table III. The initial highest M s combination was found to be A3B3C2 (see Table III).…”

Section: Analysis Of the S/n Ratiomentioning

confidence: 99%

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Improvement of Saturation Magnetization of Sputtered Fe/Al Multilayer Thin Films Using Taguchi Method Supported by ANOVA, Response Surface Methodology and Regression Analysis

et al. 2023

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Taguchi method has been conducted to improve the saturation magnetisation, Ms, of Fe/Al multilayer thin films deposited using a dual-target magnetron sputtering. The Ms values were obtained from the magnetic hysteresis loops. To evaluate the influence of deposition factors on Ms by using the Taguchi method, L9 orthogonal array with three deposition factors (A -Fe deposition rate, B -Al deposition rate, and C -Fe layer thickness) was carried out with nine experiments at three levels. For the signalto-noise ratio of the "larger is the better", the improved Ms has been obtained at A3B2C3, where factor A is 0.12 nm/s, factor B is 0.03 nm/s, and factor C is 25 nm. At A3B2C3, a verification experiment was carried out with a 95% confidence level to confirm the prediction of 1597.6 emu/cm 3 , and in the experimental run, Ms, exp was found to be 1649.0 emu/cm 3 , which was an improvement from the highest initial run, i.e., Ms, ini = 1540.2 emu/cm 3 , among prescribed runs. Analysis of variance was imposed to obtain the F-ratio and contribution percentage of each deposition factor. Also, the interactions of the deposition factors were determined with response surface methodology. For the structural properties at the best factor combinations, X-ray diffraction experiments revealed that Fe/Al films at A3B2C3 were crystallised with the mixed phase of face-centred cubic and body-centred cubic structures. According to scanning electron microscope images, the film surface is almost uniformly shaped. Furthermore, the model of Ms has also been developed using regression analysis as a function of the deposition factors A, B, and C. Then, from the regression model, high statistical performance was obtained, with values of R 2 and R 2 (adj) being 100 and 100%, respectively. It is seen that the Taguchi method supported by response surface methodology, analysis of variance, and regression analysis turned out to be very successful in finding the factors with proper levels in order to improve Ms of Fe/Al multilayer thin fims within the prescribed limit. topics: Fe/Al multilayer thin films, Taguchi method, response surface method, regression analysis

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Section: Analysis Of the S/n Ratiomentioning

confidence: 99%

“…The importance of magnetic films in today's science and technology has been proven by many studies [1][2][3][4]. These films are produced with different production techniques [5][6][7], including the sputtering method [8,9].…”

Section: Introductionmentioning

confidence: 99%

Improvement of Saturation Magnetization of Sputtered Fe/Al Multilayer Thin Films Using Taguchi Method Supported by ANOVA, Response Surface Methodology and Regression Analysis

et al. 2023

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Reduction of the noise level in mutual inductive magnetic sensors with a magnetic circuit differential

Wen

2022

Journal of Magnetism and Magnetic Materials

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Investigating the influence of substrate orientation and temperature on Cu cluster deposition

He,

Zhang,

Zheng

et al. 2024

Journal of Applied Physics

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The crystal orientation and the temperature of the substrate are crucial factors that influence clusters deposition and, consequently, the properties of thin films. In this study, the molecular dynamics simulation method was employed to investigate the deposition of Cu55 clusters on Fe(001), Fe(011), and Fe(111) substrates with varying crystal orientations. The incident energies used ranged from 0.1 to 20.0 eV/atom, and the substrates were maintained at temperatures of 300, 500, and 800 K. Analysis of cluster and substrate atom snapshots, along with the physical properties of clusters, revealed how the crystal orientation of Fe substrates affects the morphology and structure of the cluster at different temperatures. Additionally, specific microscopic mechanisms responsible for these effects were identified. The simulation results demonstrate that the crystal orientation of Fe substrate significantly influences the deposition of Cu55 clusters. The structures of the clusters on the three crystal substrates undergo similar changes as the substrate temperature increases, with the Cu55 clusters on the Fe(111) substrate exhibiting the most significant changes in response to the temperature rise.

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Modifying magnetization behavior of magnetic films utilizing surface grooved grating patterns

Cited by 7 publications

References 55 publications

Improvement of Saturation Magnetization of Sputtered Fe/Al Multilayer Thin Films Using Taguchi Method Supported by ANOVA, Response Surface Methodology and Regression Analysis

Improvement of Saturation Magnetization of Sputtered Fe/Al Multilayer Thin Films Using Taguchi Method Supported by ANOVA, Response Surface Methodology and Regression Analysis

Reduction of the noise level in mutual inductive magnetic sensors with a magnetic circuit differential

Investigating the influence of substrate orientation and temperature on Cu cluster deposition

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