Modified trilayer resist approach for ArF immersion lithography

Oh, Tae-Hwan; Nam, Yun-Suk; Kim, Suhyun; Kwak, Minkeun; Choi, Hyungsam; Chang, Chansam; Kim, Yong-Chul; Shin, Hong-Jae; Lee, Nae-In

doi:10.1117/12.814013

Advances in Resist Materials and Processing Technology XXVI 2009

DOI: 10.1117/12.814013

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Modified trilayer resist approach for ArF immersion lithography

Tae-Hwan Oh

Yun-Suk Nam

Suhyun Kim

et al.

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Modified trilayer resist approach for ArF immersion lithography

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