1999
DOI: 10.1002/(sici)1521-4109(199907)11:9<614::aid-elan614>3.0.co;2-a
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Modified Thick-Film Graphite Electrodes: Morphology and Stripping Voltammetry

Abstract: This article reports on the results of the comparative analysis covering the interrelation between the surface morphology of thick-®lm graphite electrodes (TFGE's), which were modi®ed with mercury by reduction of mercury (II) ions from solutions (in situ) and solid compounds preliminary immobilized on the working surface of the electrodes (MTFGE's), and electrochemical and analytical characteristics of both analyte elements (Cu, Pb, Cd) and mercury. Conditions of the formation and destruction of ®lms of insolu… Show more

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Cited by 21 publications
(9 citation statements)
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“…Quantifiable stripping peaks were obtained for all three analytes ( Figure 2). The broader and less well-defined Cu peak was considered due to the proximity of the Cu and Hg film oxidation potentials, irreversibility of the Cu 2+ reduction (Bradshaw & Scollary, 1997;Kadara et al, 2003) and the possible formation of insoluble Hg compounds, such as calomel, on the electrode surface due to the presence of Hg and chloride ions in the test solution (Jagner, Sahlin, & Renman, 1995;Nolan & Kounaves, 1999Zakharchuk, Saraeva, Borisova, & Brainina, 1999). This is reflected in the poorer correlation coefficient of 0.9970 achieved for Cu, as discussed below.…”
Section: Dpasv Characterizationmentioning
confidence: 99%
“…Quantifiable stripping peaks were obtained for all three analytes ( Figure 2). The broader and less well-defined Cu peak was considered due to the proximity of the Cu and Hg film oxidation potentials, irreversibility of the Cu 2+ reduction (Bradshaw & Scollary, 1997;Kadara et al, 2003) and the possible formation of insoluble Hg compounds, such as calomel, on the electrode surface due to the presence of Hg and chloride ions in the test solution (Jagner, Sahlin, & Renman, 1995;Nolan & Kounaves, 1999Zakharchuk, Saraeva, Borisova, & Brainina, 1999). This is reflected in the poorer correlation coefficient of 0.9970 achieved for Cu, as discussed below.…”
Section: Dpasv Characterizationmentioning
confidence: 99%
“…This latter method of plating compares favourably with in situ plating. 83 A method mainly used for silver substrates involves simple immersion of the electrode in liquid mercury to form the required mercury film; 84 this method can in principle be used with other amalgam-forming metal substates (e.g. Pt and Au).…”
Section: Plating Cleaning and Reactivation Of Mfe'smentioning
confidence: 99%
“…According to Zakharchuk et al. 26, under these conditions the Hg 0 nuclei remain immobile and do not coalesce into large droplets, remaining strongly bound to the surface structure. Additionally, the HCl solution is important to maintain constant the potential of the Ag pseudo reference.…”
Section: Resultsmentioning
confidence: 97%