Modified sol-gel method for patterned lithium niobate thin film preparation

Abstract

A key stage in production of the integrated optics devices is forming of microtopography on crystalline films. The current methods generally comprise two separate steps: producing of thin film and creation a topographical pattern on it. But the inherently large chemical stability of crystalline LiNbO 3 has effectively precluded the use of standard photolithographic patterning techniques. We present new approach based on the modified sol-gel technology using the photosensitive gel. In this case, the photolithography is used on the stage of dried gel whereupon the direct crystallization of patterned precursor film allows to create integrated optical element without subsequent etching of crystalline film. Presented method of patterned thin film preparation involves synthesis of photo-reactive complex of metal, which undergoes change under the UV light. This technology has allowed to obtain first samples of different types of waveguide devices.