2014
DOI: 10.1016/j.colsurfa.2014.02.015
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Modification of silicon oxide surfaces by monolayers of an oligoethylene glycol-terminated perfluoroalkyl silane

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Cited by 15 publications
(14 citation statements)
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“…Hexa(ethylene glycol) monomethyl ether tosylate (HxgOTs) was synthesized according to a literature procedure. 72 The contents were mixed thoroughly by inversion, quickly inserted into the spectrometer, and acquisition started, collecting 1 scan per data point with a delay of 5.00 s and an acquisition time of 2.1825 s.…”
Section: Experimental Section Generalmentioning
confidence: 99%
“…Hexa(ethylene glycol) monomethyl ether tosylate (HxgOTs) was synthesized according to a literature procedure. 72 The contents were mixed thoroughly by inversion, quickly inserted into the spectrometer, and acquisition started, collecting 1 scan per data point with a delay of 5.00 s and an acquisition time of 2.1825 s.…”
Section: Experimental Section Generalmentioning
confidence: 99%
“…A key, but often overlooked requirement towards supported biomimetic membranes is to accommodate the cytoplasmic as well as extracellular domains of the proteins, that is, the need for an aqueous reservoir between the support surface and the bilayer membrane. 30,31 To this end, a variety of spacers has been suggested to suspend the membranes on the support surface, such as polymer cushions, 32 polar peptides, 33,34 self assembled monolayer of oligoethylene glycol thiolates 35 as well as inert proteins. 36,37 These spacers provide an irregular support, and the quality and morphology of bilayers formed on them is hard to characterize.…”
Section: Introductionmentioning
confidence: 99%
“…Interestingly, we can also explore how an OEG‐SAM on an insulating substrate would respond to the etching pulse (Figure S11). Such layers can be formed by OEG‐terminated trichlorosilanes on glass and other oxidic surfaces [38] . The etching process may be conducted in the same way as for SAMs on Au.…”
Section: Resultsmentioning
confidence: 99%
“…Such layers can be formed by OEG-terminated trichlorosilanes on glass and other oxidic surfaces. [38] The etching process may be conducted in the same way as for SAMs on Au. However, SECM FB images of modified insulating substrates do not allow the determination of r S because the mediator used in the imaging experiment cannot be recycled at the exposed insulating substrate from which the SAM was etched away.…”
Section: Etching Of Sams On Insulating Substratesmentioning
confidence: 99%