Abstract:Amorphous silicon (a-Si), nanocrystalline silicon (nc-Si) and hydrogenated nanocrystalline silicon (nc-Si:H) films were fabricated by using chemical vapor deposition (CVD) system. The a-Si and nc-Si thin films were irradiated with 94 MeV Xe-ions at fluences of 1.0 × 10 11 ions/cm 2 , 1.0 × 10 12 ions/cm 2 and 1.0 × 10 13 ions/cm 2 at room temperature (RT). The nc-Si:H films were irradiated with 9 MeV Xe-ions at 1.0 × 10 12 Xe/cm 2 , 1.0 × 10 13 Xe/cm 2 and 1.0×10 14 Xe/cm 2 at RT. For comparison, mono-crystall… Show more
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