Modification of graphene oxide films by radiofrequency N₂plasma

Abstract

The effect of treatment in nitrogen plasma on the properties of partially reduced graphene oxide (rGO) was studied. A comparison is made between two different sample locations in the reaction chamber. It is shown that in the case when rGO films were turned towards the inductor of the plasma system, the etching rate is much higher. Effective nitrogen functionalization of rGO was established in the second position, when the rGO films were turned in the opposite direction. In this case, the nitrogen content increases to 5 at% of the initial value. The change in the current-voltage characteristics is observed under illumination, which is independent of the wavelength. On and off daylight changes the resistance to 30% of the initial value. The magnitude of the photocurrent increases depending on the applied voltage. The effect is most noticeable for thin rGO films 10-15 nm in thickness.

Plasma Treatment of Graphene Oxide

“…In many works, gases NH 3 [38][39][40] and N 2 [32,[41][42][43] are used to treat GO in the nitrogen containing plasma. Kim and et al for nitridation of rGO used NH 3 inductively coupled plasma with a power of 10 W at a pressure of 100 mTorr [38].…”

“…It was shown in [43] that, as a result of nitrogen plasma treatment, the defect formation causing an increase in the intensity of the Raman peak D of the spectra depends of location of the samples in the reaction chamber. The substrate was placed "face down" into the plasma chamber (Figure 1), which significantly reduced the formation of defects in the rGO.…”

Properties of Nanographite Formed by Plasma Deposition and Subsequent Heat Treatment

“…Преимущество ПХ-ОГФ заключается в возможности снижения температуры процесса до 450 С без использования катализаторов [6] и повышении скорости осаждения [6]. В то же время непосредственное воздействие плазмы может привести к образованию высокой плотности дефектов [8] в формируемых пленках и образованию вертикальных углеродных структур за счет собственного электрического поля [5]. Уменьшить образование дефектов и устранить вертикальный рост позволяет метод удаленного плазмо-химического осаждения, в котором реакционные камеры плазменной системы и установки ОГФ пространственно разделены, но совмещены потоки газов [9].…”

Facile preparation of polymer coating on reduced graphene oxide sheets by plasma polymerization

“…For example, doped carbon materials are of interest when used as electrode or catalytic materials. Neustroev et al introduced pyrrole-N and pyridine-N doping to the graphene by N 2 plasma [16]. Lai introduced oxygen-containing groups to the surface of electrospun carbon nanofibers using oxygen plasma to improve its capacitive behavior [17].…”