2020
DOI: 10.1016/j.diamond.2020.107873
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Modification of a-C:H films via nitrogen and silicon doping: The way to the superlubricity in moisture atmosphere

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Cited by 36 publications
(17 citation statements)
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“…Another used technique consists of the doping of the film with different elements, such as boron, fluorine and nitrogen, which has been widely used to relieve the internal stress of the film [14][15][16].The effects of the nitrogen incorporating in DLC film is the reduction of the internal stress due to the decrease in the formation of carbon atoms with sp 3 hybridization. As a consequence, the film hardness is reduced and the DLC film adhesion on the substrate is facilitated, arousing interest in synthesis and application of these films [15][16][17][18][19][20][21]67].The production of DLC and N-DLC films by plasma enhanced chemical vapor deposition (PECVD) technique comes as a potential alternative of a surface treatment since it presents a relatively low cost, clean technology and formation of the homogeneous and uniform film [9,22]. This technique is being the focus of research for DLC film formation in Ti 6 Al 4 V alloy for space application [23], for application of DLC film in 316L stainless steel to act as anti-bactericidal agent in biomedical device [24], used to produce DLC film on inner surface of a long stainless steel tube [25], used to show the beneficial effects on the increased electrochemical activity of the DLC film doped with nitrogen [16,26] and to investigate the lubricating effect of the DLC film doped with nitrogen deposited on 3024 stainless steel to improve the tribocorrosion properties of the studied material [27].Since nitrogen is a low cost and environmentally friendly gas, it could be used to modify the undesirable properties of the DLC film, maintaining the high hardness and low coefficient of friction characteristic of the a-C:H films.…”
mentioning
confidence: 99%
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“…Another used technique consists of the doping of the film with different elements, such as boron, fluorine and nitrogen, which has been widely used to relieve the internal stress of the film [14][15][16].The effects of the nitrogen incorporating in DLC film is the reduction of the internal stress due to the decrease in the formation of carbon atoms with sp 3 hybridization. As a consequence, the film hardness is reduced and the DLC film adhesion on the substrate is facilitated, arousing interest in synthesis and application of these films [15][16][17][18][19][20][21]67].The production of DLC and N-DLC films by plasma enhanced chemical vapor deposition (PECVD) technique comes as a potential alternative of a surface treatment since it presents a relatively low cost, clean technology and formation of the homogeneous and uniform film [9,22]. This technique is being the focus of research for DLC film formation in Ti 6 Al 4 V alloy for space application [23], for application of DLC film in 316L stainless steel to act as anti-bactericidal agent in biomedical device [24], used to produce DLC film on inner surface of a long stainless steel tube [25], used to show the beneficial effects on the increased electrochemical activity of the DLC film doped with nitrogen [16,26] and to investigate the lubricating effect of the DLC film doped with nitrogen deposited on 3024 stainless steel to improve the tribocorrosion properties of the studied material [27].Since nitrogen is a low cost and environmentally friendly gas, it could be used to modify the undesirable properties of the DLC film, maintaining the high hardness and low coefficient of friction characteristic of the a-C:H films.…”
mentioning
confidence: 99%
“…The effects of the nitrogen incorporating in DLC film is the reduction of the internal stress due to the decrease in the formation of carbon atoms with sp 3 hybridization. As a consequence, the film hardness is reduced and the DLC film adhesion on the substrate is facilitated, arousing interest in synthesis and application of these films [15][16][17][18][19][20][21]67].…”
mentioning
confidence: 99%
“…To deeply understand the information of Raman spectra, a variation of half‐maximum width of G peaks (G FWHM ) and I D /I G from the mating material of uncoated‐GCr15, Al 2 O 3 , ZrO 2 , Si 3 N 4 , and a‐C:H(GCr15) are given in Figure 7F. The G FWHM is an important indicator to measure the carbon crystallinity 18 . Generally, a carbon‐based film with a high degree of order has a narrower half‐value width, whereas a disordered amorphous carbon structure has a larger one.…”
Section: Resultsmentioning
confidence: 99%
“…Besides, the deposition methods determine its nature of DLC film. Usually, superhard tetrahedral carbon (ta‐C) film is grown by filtered cathodic vacuum arc (FCVA), 12,13 hydrogenated tetrahedral amorphous carbon (ta‐C:H) film is obtained via electron cyclotron wave resonance (ECR) plasma system, 14 and (hydrogenated) amorphous carbon (a‐C:(H)) films are deposited from plasma assistant chemical vapor deposition (PECVD) 15–18 and magnetron sputtering technology 16 . Among them, magnetron sputtering, due to its less equipment requirements, low cost and more flexibility, has been taken more attention via science and engineering 17 .…”
Section: Introductionmentioning
confidence: 99%
“…The analysis of published data on the triboinduced graphitization of the interface layer for TMD+C and a-C(H) coatings and their comparison with the results of this work showed that S atoms incorporated into the a-C(H) phase during the RPLD of Mo–S–C–H_5.5 films did not have a significant effect on the formation of tribofilms during friction in a dry atmosphere. The relatively narrow G and D peaks located at 1355 and 1580 cm −1 respectively, correspond to the graphite/graphene-like packing of atoms with a laminar structure [ 46 , 71 , 73 , 74 , 75 ]. The incorporation of S atoms into the graphene structure may not cause noticeable changes in the Raman spectrum of graphene [ 76 ].…”
Section: Discussionmentioning
confidence: 99%