Modelling of plasma generation and thin film deposition by a non-thermal plasma jet at atmospheric pressure

Sigeneger, F.; Becker, Markus M.; Foest, Rüdiger; Loffhagen, Detlef

doi:10.1088/0022-3727/49/34/345202

Cited by 17 publications

(37 citation statements)

References 61 publications

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“…Furthermore, this figure illustrates the beam‐like structure of the gas flow in the effluent and the rapid transition from the axial flow into a radial flow near the stagnation point at

r = 0

z = - 6

mm. Thus, the gas flow conditions chosen here strongly deviate from those which have been investigated previously …”

Section: Resultsmentioning

confidence: 95%

“…The fluid model for the plasma comprises electrons, atomic (Ar

^{+}

), and molecular (

{A r}_{2}^{+}

) ions, atoms excited in metastable (Ar

^{normalm}

), resonance (Ar

^{normalr}

), and a higher lumped (Ar

^{normalp}

) state as well as the excimers

{A r}_{2} true(^{3} Σ_{u}^{+} true)

and

{A r}_{2} true(^{1} Σ_{u}^{+} true)

. The reaction kinetics of the argon species includes elastic collisions, 12 exciting and de‐exciting, and 6 ionizing collision processes between neutral species and electrons . The electron transport coefficients and the rate coefficients of electron atom collisions have been calculated in advance by solving the 0D Boltzmann equation for the electrons and are tabulated as functions of the mean electron energy.…”

Section: Main Features Of the Modelmentioning

confidence: 99%

“…Because of lack of data, only a simplified model was applied here which lumps all neutral and charged precursor fragments in respective species

PF

and

{PF}^{+}

. In addition to the most important precursor reactions

HMDSO + A {normalr}_{2}^{+} \to {PF}^{+} + 2 Ar

{PF}^{+} + e \to PF

further eight reactions between HMDSO and active argon species generating

PF

and

{PF}^{+}

have been taken into account …”

Section: Main Features Of the Modelmentioning

confidence: 99%

“…The transport coefficients of the charged and excited argon species are given in ref . Due to lack of data, Fuller's method has been used to determine approximately the reduced diffusion coefficient of precursor fragments

PF

in the buffer gas argon

N_{normalg} D_{PF} = 1.46 \times 10^{20}

m −1 s −1 .…”

Section: Main Features Of the Modelmentioning

confidence: 99%

“…have been applied for all species and for the electron energy flux at the boundaries between plasma and dielectric walls. Details of these boundary conditions are described in ref …”

Section: Main Features Of the Modelmentioning

confidence: 99%

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Modeling of a Non‐Thermal RF Plasma Jet at Atmospheric Pressure

Sigeneger

Schäfer

Weltmann

et al. 2016

Plasma Processes & Polymers

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An RF driven non‐thermal atmospheric pressure plasma jet used for plasma enhanced chemical vapor deposition is investigated by hydrodynamic modeling. The model describes the gas flow and heating, the plasma generation in the active zone, reactions of active plasma particles with precursor molecules in the effluent, and the transport of precursor fragments toward the substrate. Molecular argon ions are found to be the dominant active species transported into the effluent together with slow electrons. The radial profiles of the fluxes of precursor fragments onto the substrate depend sensitively on the flow conditions. Satisfactory agreement of the calculated gas temperature with measured profiles is obtained.

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“…Furthermore, this figure illustrates the beam‐like structure of the gas flow in the effluent and the rapid transition from the axial flow into a radial flow near the stagnation point at

r = 0

z = - 6

mm. Thus, the gas flow conditions chosen here strongly deviate from those which have been investigated previously …”

Section: Resultsmentioning

confidence: 95%

“…The fluid model for the plasma comprises electrons, atomic (Ar

^{+}

), and molecular (

{A r}_{2}^{+}

) ions, atoms excited in metastable (Ar

^{normalm}

), resonance (Ar

^{normalr}

), and a higher lumped (Ar

^{normalp}

) state as well as the excimers

{A r}_{2} true(^{3} Σ_{u}^{+} true)

and

{A r}_{2} true(^{1} Σ_{u}^{+} true)

Section: Main Features Of the Modelmentioning

confidence: 99%

“…Because of lack of data, only a simplified model was applied here which lumps all neutral and charged precursor fragments in respective species

PF

and

{PF}^{+}

. In addition to the most important precursor reactions

HMDSO + A {normalr}_{2}^{+} \to {PF}^{+} + 2 Ar

{PF}^{+} + e \to PF

further eight reactions between HMDSO and active argon species generating

PF

and

{PF}^{+}

have been taken into account …”

Section: Main Features Of the Modelmentioning

confidence: 99%

PF

in the buffer gas argon

N_{normalg} D_{PF} = 1.46 \times 10^{20}

m −1 s −1 .…”

Section: Main Features Of the Modelmentioning

confidence: 99%

“…have been applied for all species and for the electron energy flux at the boundaries between plasma and dielectric walls. Details of these boundary conditions are described in ref …”

Section: Main Features Of the Modelmentioning

confidence: 99%

See 3 more Smart Citations

Modeling of a Non‐Thermal RF Plasma Jet at Atmospheric Pressure

Sigeneger

Schäfer

Weltmann

et al. 2016

Plasma Processes & Polymers

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Numerical modeling of gas‐phase reactions of tetraethoxysilane/O2/Ar atmospheric dielectric barrier discharge for deposition

Chang

Dai

Kong

et al. 2023

Plasma Processes & Polymers

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A chemical kinetic model is developed to study the decomposition of tetraethoxysilane (TEOS) in O2/Ar atmospheric pressure dielectric barrier discharge and compared with gas chromatography and optical emission spectroscopy results. The calculations indicate that the excited Ar dominates the fragmentation of TEOS in the absence of oxygen and mainly breaks the carbon–carbon bonds in TEOS. However, in the presence of oxygen, the primary decomposition process of TEOS is the substitution of ethoxy (–OC2H5) by hydroxyl (–OH). The variation of these two reactions with oxygen composition could explain the transition of the deposition layer from organic to norganic. The model and its results provide a theoretical basis for further modeling and regulating the quality of the deposition layer.

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Microbubble-enhanced DBD plasma reactor: Design, characterisation and modelling

Wright

Taglioli

Montazersadgh

et al. 2019

Chemical Engineering Research and Design

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The emerging field of atmospheric pressure plasmas (APPs) for treatment of various solutions and suspensions has led to a variety of plasma reactors and power sources. This article reports on the design, characterisation and modelling of a novel plasma-microbubble reactor that forms a dielectric barrier discharge (DBD) at the gas-liquid interface to facilitate the transfer of short-lived highly reactive species from the gas plasma into the liquid phase. The use of microbubbles enabled efficient dispersion of long-lived reactive species in the liquid and UVC-induced oxidation reactions are triggered by the plasma radiation at the gas-liquid interface. A numerical model was developed to understand the dynamics of the reactor, and the model was validated using experimental measurements. Fluid velocities in the riser region of the reactor were found to be an order of magnitude higher for smaller bubbles (~500 µm diameter) than for larger bubbles (~2500 µm diameter); hence provided well-mixed conditions for treatment. In addition to other reactive oxygen species (ROS) and reactive nitrogen species (RNS), �� Interfacial area m-1 Dynamic liquid velocity Pa s Volume m 3 Molecular weight g mol-1 1.0 Introduction Ozone has been established as an excellent oxidising agent and used on industrial scale for water treatment worldwide (Loeb et al., 2012). Its high oxidation potential of 2.07 V is superior to that of chlorine (1.36 V), and

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Modelling of plasma generation and thin film deposition by a non-thermal plasma jet at atmospheric pressure

Cited by 17 publications

References 61 publications

Modeling of a Non‐Thermal RF Plasma Jet at Atmospheric Pressure

Modeling of a Non‐Thermal RF Plasma Jet at Atmospheric Pressure

Numerical modeling of gas‐phase reactions of tetraethoxysilane/O2/Ar atmospheric dielectric barrier discharge for deposition

Microbubble-enhanced DBD plasma reactor: Design, characterisation and modelling

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