2002
DOI: 10.1016/s0921-4534(02)00795-5
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Modeling thermal transient process in HTS microstrip line with non-homogeneous current density distribution

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“…The temperature of the substrate and the external lines is assumed to be changed within distance from the film. The assumption is based on the cylindrical model of the heat removal [3]. The parameter depends on the film width and the substrate thickness:…”
Section: Model Under Investigationmentioning
confidence: 99%
“…The temperature of the substrate and the external lines is assumed to be changed within distance from the film. The assumption is based on the cylindrical model of the heat removal [3]. The parameter depends on the film width and the substrate thickness:…”
Section: Model Under Investigationmentioning
confidence: 99%