2012
DOI: 10.1063/1.4731879
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Modeling the underlying mechanisms for organic memory devices: Tunneling, electron emission, and oxygen adsorbing

Abstract: We present a combined experimental and theoretical study to get insight into both memory and negative differential resistance (NDR) effect in organic memory devices. The theoretical model we propose is simply a one-dimensional metallic island array embedding within two electrodes. We use scattering operator method to evaluate the tunneling current among the electrode and islands to establish the basic bistable I-V curves for several devices. The theoretical results match the experiments very well, and both mem… Show more

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Cited by 6 publications
(4 citation statements)
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“…This indicates that the number of the carriers injected into the Ag 2 S/PVK layer is increased greatly when the sweeping voltage is higher than a certain voltage, and the electrons can be captured by the traps of the Ag 2 S nanocrystals with an exponential distribution in the forbidden gap, in which a large number of sulfur vacancies formed on the surface of Ag 2 S nanocrystals act as the charge traps [ 25 ]. When the devices are measured in the presence of air, the molecular oxygen may react with the sulfur vacancies to form a bridging oxide dimer to act as a potential barrier around the Ag 2 S nanocrystals [ 26 , 27 ]. Thus, the number of the injected carriers trapped by the barrier may be increased, which is responsible for the high slope of the fitting line of the devices measured in air.…”
Section: Resultsmentioning
confidence: 99%
“…This indicates that the number of the carriers injected into the Ag 2 S/PVK layer is increased greatly when the sweeping voltage is higher than a certain voltage, and the electrons can be captured by the traps of the Ag 2 S nanocrystals with an exponential distribution in the forbidden gap, in which a large number of sulfur vacancies formed on the surface of Ag 2 S nanocrystals act as the charge traps [ 25 ]. When the devices are measured in the presence of air, the molecular oxygen may react with the sulfur vacancies to form a bridging oxide dimer to act as a potential barrier around the Ag 2 S nanocrystals [ 26 , 27 ]. Thus, the number of the injected carriers trapped by the barrier may be increased, which is responsible for the high slope of the fitting line of the devices measured in air.…”
Section: Resultsmentioning
confidence: 99%
“…Similarly, the NDR effect also exists in organic semiconducting devices, where it is believed to originate in the tunneling process across the energy barrier at the metal/organic interface. 39 Here, we use the WF-HEOM approach to calculate the current-voltage (I-V) curves in the NDR regime for a semiconducting material that bridges two electrodes in the presence of two Guassian-shaped interface energy barriers given by aexp [− (q − q 0 ) 2 /c 2 ] with a = 0.3 eV and c = 2 nm. The distance between these two barriers is 5 nm, and the rest of model parameters are: the electron effective mass is 0.067m 0 with m 0 the mass of free electron; the discretization number for coordinate and momentum N q and N p are 80 and 60, respectively; the mesh spacing q is 0.5 nm such that p = π /N q q .…”
Section: A I-v Curve In Resonant Tunneling Diodesmentioning
confidence: 99%
“…Each data point requires more than 10 h of computation on a Linux-based computing cluster, with each CPU being a 2.67 GHz Intel processor, rendering the WF-HEOM method less efficient than the scattering-operator method. 39 However, it is easier to apply the WF-HEOM approach to our system than the scattering-operator method. In particular, the NDR effect has been reproduced for the semiconducting devices in a unified manner, while with scattering operator method, results need to be rescaled on a caseby-case basis.…”
Section: A I-v Curve In Resonant Tunneling Diodesmentioning
confidence: 99%
“…Generally, filament formation is thought to be also related to the unintentional incorporation of metal particles during the thermal evaporation of the top electrode (TE). 16,17) Based on our previous work, 14,15,18) we here further elucidate the origin of unipolar resistance switching in ORS. By comparing current-voltage (I-V) characteristics of devices with conventionally evaporated top electrodes with metal transfer printed (MTP) top electrodes the hypothesis that metal implantation during the deposition of the TE is essential for switching is benchmarked.…”
mentioning
confidence: 95%